Patent US3754946A successfully refreshed from Google Patents.
US3754946A
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Refractory laminate based on negative sols or silicates and non polymeric organic cationic nitrogen containing compounds
Assignee: EIDP Inc
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Filing: 1971-06-01
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Granted: 1973-08-28
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Expires: 1991-06-01
Abstract
Abstract A rapid process for forming a refractory laminate on the surface of a support structure which comprises dipping the structure in a bath comprising a sol of negatively charged colloidal particles of an inorganic substance and/or a solution of an alkaline ionic silicate to form a coating on the surface, contacting the coated surface with a non-polymeric nitrogen-containing cationic organic setting agent to firmly set the negative sol or silicate solution. This procedure is repeated until a laminate of the desired thickness is built up on the surface. In order to increase the rate of laminate build-up particulate refractory material can be included in the bath and/or the coated surface can be stuccoed between dips. Interaction between the negatively charged colloidal particles or silicate and the cationic organic setting agent results in the polymerization of the colloid or silicate and thereby the immobilization of the coatings. This technique makes it possible to successively apply and set coatings to built refractory laminates in very short times without intermediate drying and without sloughing of coats. The process is particularly suited for making expendable, refractory shell molds for precision investment casting of metals by the socalled ''''lost-wax'''' technique.
Inventors
- 👤 E Moore
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 13:39
CPC Classifications
B; B22; B22C; B22C9/00; B22C9/02; B22C9/04; B22C1/00; B22C1/16; B22C1/165
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
26 words
Process of claim 1 wherein the bath of step (a) is a slurry of particulate refractory material in a sol of negatively charged colloidal silica particles.
Claim 2
Dependent Claim
19 words
Process of claim 2 wherein in step (b) the surface is dipped into a solution of the setting agent.
Claim 3
Dependent Claim
158 words
A rapid process for forming expendable, refractory shell molds for precision investment casting of metals comprising: a. dipping a disposable pattern of the metal casting in a bath comprising at least one member of the group consisting of a sol of negatively charged collidal particles selected from the group consisting of silica particles and bentonite, attapulgite and kaolinite clay particles and a solution of a quaternary ammonium, sodium, potassium or lithium silicate to form a coating on the pattern, b. contacting the coated pattern with a solution or dispersion of a non-polymeric nitrogen-containing monocationic organic setting agent selected from the group consisting of long chain amines and the organic and inorganic acid salts thereof and substituted onium salts of organic and inorganic acids to firmly set the coating, c. removing excess setting agent from the coated pattern, and d. repeating steps (a) through (c) in sequence as required to build a refractory shell mold of the desired thickness.
Claim 4
Dependent Claim
25 words
Process of claim 4 wherein the bath of step (a) is a Slurry of refractory grain in a sol of negatively charged colloidal silica particles.
Claim 5
Dependent Claim
15 words
Process of claim 5 wherein the coated pattern is stuccoed between steps (a) and (b).
Claim 6
Dependent Claim
20 words
Process of claim 6 wherein in step (b) the stuccoed pattern is dipped into a solution of the setting agent.
Claim 7
Dependent Claim
50 words
Process of claim 7 wherein two slurries of refractory grain in a sol of negatively charged silica particles are used, the first slurry containing relatively fine refractory grain and being used for the prime coat, and the second slurry containing relatively coarse refractory grain and being used for subsequent coats.
Claim 8
Dependent Claim
60 words
Process of claim 8 wherein the setting agent is a member of the group consisting of amines and their organic and inorganic acid salts and substituted onium salts of organic and inorganic acids in which there is attached to the amine or onium nitrogen at least one and no more than two alkyl chains of six to 25 carbon atoms.
Claim 9
Dependent Claim
60 words
Process of claim 8 wherein the setting agent is a member of the group consisting of amines and their organic and inorganic acid salts in which there is attached to the amine nitrogen at least one, but no more than two, alkyl chains of between eight and 20 carbon atoms and which contain between eight and 40 atoms in total.
Claim 10
Dependent Claim
52 words
Process of claim 8 in which the setting agent is a member of the group consisting of n-octylamine, 4-hexylcyclohexylamine, di-n-decylamine, ethyltetradecylamine, p-hexadecyl-N,N-dimethylaniline, dodecylamine, ethyloctylamine, and dimethyldecylamine and their salts with HCl, HBr, HI, NH2SO3H, H2SO4, H3PO4, formic acid, acetic acid, hydroxyacetic acid, citric acid, oxalic acid and partially esterfied H2SO4 and H3PO4.
Claim 11
Dependent Claim
61 words
Process of claim 8 wherein the setting agent is a member of the group consisting of onium salts of organic and inorganic acids in which there is attached to the onium nitrogen at least one, but no more than two, alkyl chains of between eight and 20 carbon atoms and which contain a total of between 11 and 50 carbon atoms.
Claim 12
Dependent Claim
66 words
Process of claim 8 wherein the setting agent is a member of the group consisting of n-octyltrimethylammonium chloride, dodecyldimethylethylammonium bromide, tetradecyldiethylbenzylammonium ethosulfate, dicocodimethylammonium acetate, dodecylbenzyltrimetylammonium chloride, N-eicosylpyridinium bromide, octadecyltrimethylammonium chloride, dodecyltrimethylammonium bromide, 2-pentadecyltrimethylammonium halides, hexadecyltrimethylammonium chloride, didodecyldimethylammonium acetate, lower alkyl substituted imidazolines of tetradecanoic acid, dodecylbenzyltrimethylammonium chloride, cetylpyridinium chloride, oleyl and linoleyltrimethylammonium halides, cetyltrimethylammonium halides, and the quaternary derivatives of alkyl substituted imidazolines of dodecanoic acid.
Claim 13
Dependent Claim
29 words
Process of claim 1 wherein the bath of step (a) is a slurry of particulate refractory material in a solution of a quaternary ammonium, sodium, potassium or lithium silicate.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-08-27 | 1977-02-26 | 1977-08-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-08-27 | 1981-02-26 | 1981-08-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-08-27 | 1985-02-26 | 1985-08-28 | $7700.00 | Window Closed / Lapsed |