Patent US3754125A successfully refreshed from Google Patents.
US3754125A
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Vent gas control system
Assignee: EIDP Inc
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Filing: 1971-01-06
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Granted: 1973-08-21
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Expires: 1991-01-06
Abstract
Abstract A process and apparatus for reacting a gas and a liquid by selectively adjusting the vent gas rate in relation to the liquid feed rate, impurities in the gas feed and impurities in the vent gas.
Inventors
- 👤 M Rothstein
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 18:46
CPC Classifications
C; C07; C07C; C07C209/00; C07C209/30; C07C209/32; C07C209/36; B; B01; B01J; B01J19/00; B01J19/0006
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
209 words
In a continuous process for reacting a liquid with an impure gas in a reaction zone containing a liquid phase and a gas phase whereby liquid and gas reactants are continuously fed to the reaction zone and reaction product and unreacted gas are continuously removed, the improvement consisting essentially of periodically transmitting to a computer signals representing a. the liquid feed rate b. the concentration of impurities in the gaseous reactant c. the concentration of impurities in the gas phase in the reaction zone said computer being programmed to generate a signal representative of gas removal rate V in accordance with the equation V2 (0.132)2F2 (X1 + K(e + (de/dt) gamma ))2/(X2)2 where: F gas feed rate, Kg./hr. X1 actual impurity concentration in the feed gas, mole percent X2 actual impurity concentration of the vent gas, mole percent e error difference between the desired (normal) and the actual impurity concentration of the vent gas (e 0 for steady state conditions), mole percent K controller gain (percent per volt) gamma process time constant of gas contained in the reactor and the vent gas system (minutes) t time (minutes) V vent gas flow rate on water-wet basis, Kg./hr. and adjusting the gas removal rate in accordance with the signal so generated.
Claim 2
Dependent Claim
209 words
In a continuous process for reacting a liquid with an impure gas in a reaction zone containing a liquid phase and a gas phase whereby liquid and gas reactants are continuously fed to the reaction zone and reaction product and unreacted gas are continuously removed, the improvement consisting essentially of periodically transmitting to a computer signals representing a. the liquid feed rate b. the concentration of impurities in the gaseous reactant c. the concentration of impurities in the gas phase in the reaction zone said computer being programmed to generate a signal representative of gas removal rate V in accordance with the equation V2 (0.132)2F2 (X1 + K(e + (de/dt) gamma ))2/(X2)2 where: F gas feed rate, Kg./hr. X1 actual impurity concentration in the feed gas, mole percent X2 actual impurity concentration of the vent gas, mole percent e error difference between the desired (normal) and the actual impurity concentration of the vent gas (e 0 for steady state conditions), mole percent K controller gain (percent per volt) gamma process time constant of gas contained in the reactor and the vent gas system (minutes) t time (minutes) V vent gas flow rate on water-wet basis, Kg./hr. and adjusting the gas removal rate in accordance with the signal so generated.
Claim 3
Dependent Claim
31 words
The process of claim 1 in which the computer generated signal is transmitted to a vent gas controller which automatically adjusts the gas removal rate in accordance with the generated signal.
Claim 4
Dependent Claim
18 words
The process of claim 1 in which the reactant liquid is dinitrotoluene and the reactant gas is hydrogen.
Claim 5
Dependent Claim
27 words
The process of claim 3 in which the reactant gas fed to the reaction zone is hydrogen having a purity of at least about 98 mole percent.
Claim 6
Dependent Claim
22 words
The process of claim 4 in which the gas phase in the reaction zone has an impurity content of about 10-15 percent.
Claim 7
Dependent Claim
181 words
Apparatus for controlling the efficiency of a reaction between a liquid and a gas phase comprising a. a closed reactor fitted with inlet ports for reactant gas and reactant liquid and exit ports for reaction product and unreacted reactant gas, b. means for measuring and transmitting a signal representative of the rate of flow of reactant liquid to the reactor, c. means for measuring and transmitting a signal representative of the concentration of impurities in the flow of reactant gas to the reactor, d. means for measuring and transmitting a signal representative of the concentration of impurities in the gas phase of the reactor, e. means for measuring and transmitting a signal representative of the flow rate of gas leaving the reactor, f. computer means adapted for collecting the above signals and programmed to compute therefrom a flow rate for gas leaving the reactor to maintain the impurity content of the gas phase in the reaction zone within predetermined limits, and g. means for adjusting the flow rate of gas leaving the reactor to the flow rate prescribed by the computer.
Claim 8
Dependent Claim
181 words
Apparatus for controlling the efficiency of a reaction between a liquid and a gas phase comprising a. a closed reactor fitted with inlet ports for reactant gas and reactant liquid and exit ports for reaction product and unreacted reactant gas, b. means for measuring and transmitting a signal representative of the rate of flow of reactant liquid to the reactor, c. means for measuring and transmitting a signal representative of the concentration of impurities in the flow of reactant gas to the reactor, d. means for measuring and transmitting a signal representative of the concentration of impurities in the gas phase of the reactor, e. means for measuring and transmitting a signal representative of the flow rate of gas leaving the reactor, f. computer means adapted for collecting the above signals and programmed to compute therefrom a flow rate for gas leaving the reactor to maintain the impurity content of the gas phase in the reaction zone within predetermined limits, and g. means for adjusting the flow rate of gas leaving the reactor to the flow rate prescribed by the computer.
References Cited (Backward Citations)
US3032586A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-08-20 | 1977-02-19 | 1977-08-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-08-20 | 1981-02-19 | 1981-08-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-08-20 | 1985-02-19 | 1985-08-21 | $7700.00 | Window Closed / Lapsed |