Patent US3753022A successfully refreshed from Google Patents.
US3753022A
Expired / Lapsed
US
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Miniature, directed, electron-beam source
Assignee: United States Department of the Army
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Filing: 1971-04-26
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Granted: 1973-08-14
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Expires: 1991-04-26
Abstract
Abstract A miniature, directed, electron-beam source, consisting of a conventional field emission source with an associated first anode plate, and several deposited layers of alumina and molybdenum for focusing and deflecting the electron beam, the deposited layers having a column etched through them to the field emission source.
Inventors
- 👤 D Fraser
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 05:27
CPC Classifications
H; H01; H01J; H01J3/00; H01J3/02; H01J3/021; H01J3/022; H01J1/00; H01J1/02; H01J1/30; H01J1/304; H01J1/3042; H01J3/027
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
147 words
A miniature, directed electron beam source comprising: an electrically conductive base; a point source of electrons deposited on said base; means for focusing said electrons, said focusing means including at least a first electrically insulative layer and at least a first anode, said at least first insulative layer being deposited on said base and said at least first anode being deposited on said insulative layer said focusing means being apertured to expose said electron source; and means for deflecting said electrons, said deflecting means including an apertured electrically insulative layer and at least four deflecting plates, said insulative layer being deposited on said focusing means and to a depth of at least 20 microns, and said deflecting plates being deposited on said insulative layer abutting said aperture within said deflecting means each of said deflecting plates having a dimension along said aperture substantially equal to said depth.
Claim 2
Dependent Claim
147 words
A miniature, directed electron beam source comprising: an electrically conductive base; a point source of electrons deposited on said base; means for focusing said electrons, said focusing means including at least a first electrically insulative layer and at least a first anode, said at least first insulative layer being deposited on said base and said at least first anode being deposited on said insulative layer said focusing means being apertured to expose said electron source; and means for deflecting said electrons, said deflecting means including an apertured electrically insulative layer and at least four deflecting plates, said insulative layer being deposited on said focusing means and to a depth of at least 20 microns, and said deflecting plates being deposited on said insulative layer abutting said aperture within said deflecting means each of said deflecting plates having a dimension along said aperture substantially equal to said depth.
Claim 3
Dependent Claim
39 words
An electron beam source in accordance with claim 1, wherein said focusing means includes first and second anodes, each anode having an aperture therein, said anodes being separated by a material which is inert with respect to said anodes.
Claim 4
Dependent Claim
21 words
An electron beam source in accordance with claim 2, wherein said source of electrons is a field emission source of electrons.
Claim 5
Dependent Claim
75 words
An electron beam source in accordance with claim 3, wherein said field emission source comprises: a sapphire substrate; a cathode layer of molybdenum deposited on said substrate; a cathode cone oF molybdenum deposited on said cathode layer; and a first layer of alumina, deposited on said cathode layer, and having an aperture therein, and said first anode layer of molybdenum deposited on said first layer of alumina, said first anode layer having an aperture therein.
Claim 6
Dependent Claim
68 words
An electron beam source in accordance with claim 4, wherein said focusing means includes said first anode layer of molybdenum, said first anode deposited on said first layer of alumina, and having an aperture therein; a second layer of alumina, deposited on said first anode and having an aperture therein; and a second layer of molybdenum, deposited on said second layer of alumina and having an aperture therein.
Claim 7
Dependent Claim
73 words
An electron beam source in accordance with claim 5, wherein said deflecting means includes a third layer of alumina deposited on said second anode layer, said third layer of alumina having an aperture therein; and four deflection plates, said deflection plates being deposited within said aperture of said third layer of alumina, said deflection plates being deposited at substantially equal angles to each other, and impinging only on said third layer of alumina.
Claim 8
Dependent Claim
51 words
An electron beam source in accordance with claim 6, wherein said third layer of alumina is at least 20 microns at its thickest point, and wherein said aperture in said first and second anode and said first, second and third alumina layers is not more than 4 microns in cross section.
References Cited (Backward Citations)
US3023336A
Cited
US3579013A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-08-13 | 1977-02-12 | 1977-08-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-08-13 | 1981-02-12 | 1981-08-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-08-13 | 1985-02-12 | 1985-08-14 | $7700.00 | Window Closed / Lapsed |