Composition and process for cleaning ion exchange resins
Abstract
Abstract WHERE Z IS SELECTED FROM THE GROUP CONSISTING OF H AND ALIPHATIC HYDROCARBON RADICALS OF FROM 4 TO 18 CARBON ATOMS, AND X IS AN INTEGER OF FROM 1 TO 20; AND (E) FROM 1 TO 15% OF AN ALKALI INORGANIC PHOSPHATE, IS DISCLOSED. A PROCESS FOR USING THIS COMPOSITION IS ALSO DISCLOSED. Z-CYCLOHEXYL- WHERE R IS INDEPENDENTLY SELECTED FROM THE GROUP CONSISTING OF H, LOWER ALIPHATIC RADICAL OF FROM 1 TO 6 CARBON ATOMS AND RADICALS HAVING THE FORMULA: R(OCH2CH2)XOR A COMPOSITION USEFUL FOR CLEANING ION EXCHANGE RESIN BEDS, COMPRISING: (A) FROM 60 TO 90% BY WEIGHT OF WATER; (B) FROM 0.5 TO 4% OF AN UNSUBSTITUTED, LIQUID ALIPHATIC HYDROCARBONS HAVING FROM 5 TO 10 CARBON ATOMS IN CHAIN LENGTH; (C) FROM 0 TO 10.0% OF A WETTING AGENT SELECTED FROM THE GROUP CONSISTING OF SULFATED ALCOHOLS AND SULFONATED HYDROCARBONS AND HAVING FROM 6 TO 22 CARBON ATOMS IN CHAIN LENGTH; (D) FROM 5.0 TO 15.0% OF AN ORGANIC COMPOUND HAVING THE FORMULA
Inventors
- 👤 D Wiltsey
- 👤 A Oberhofer
- 👤 R Bloemke
- 👤 A Karklins
Bibliographic Details
Claims Analysis
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