Patent US3745358A successfully refreshed from Google Patents.
US3745358A
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US
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Alignment method and apparatus for electron projection systems
Assignee: RADIANT ENERGY SYST INC US
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Filing: 1971-05-10
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Granted: 1973-07-10
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Expires: 1991-05-10
Abstract
Abstract An alignment method and apparatus for electron projection systems whereby the electron image may be automatically aligned with respect to the surface of the article on which the electron image is to be projected. The article to receive the electron image is provided with reference holes perpendicular to the surface which is to receive the electron image and extending through the article. Electron beams are first directed only to the general vicinity of the reference holes and are deflected by the deflection means for the electron beam so as to scan the general vicinity of the holes. A sensor is located in the apparatus beneath each of the holes to detect the electron beam passing through the holes, and is coupled to a computer controlling the beam deflection so as to provide information to the computer regarding the intensity of the electron beam passing through the alignment holes. The computer is programmed to control the beam and to operate on the information obtained from the sensor so as to determine the proper deflection means control signal for aligning the electron image with respect to the reference holes. Various scanning methods and beams of various characteristics are disclosed.
Inventors
- 👤 R Firtz
- 👤 W Livesay
- 👤 M Wing
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 09:22
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/304; H01J37/3045; H01J29/00; H01J29/46; H01J29/54; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/948; Y10S438/949
Claims Analysis
Total Claims: 27
Claim 1
Independent Claim
196 words
An electron image alignment system for use with a photocathode haVing a first region for projection of at least one electron image thereon and having at least two second regions for projection of reference electron beams therefrom, and an article on which the image is to be projected having alignment holes in substantially the same pattern as said second regions, comprising: means for illuminating said second regions of said photocathode so as to cause photoemission of electrons therefrom; means for accelerating electrons emitted from said second regions toward said article; deflection means for deflecting said beams and said electron image responsive to a deflection signal; sensing means for sensing the passage of each of said beams through said alignment holes; and means coupled to said deflection means and said sensing means for controlling said deflection means and for determining the position of the centers of said alignment holes, in terms of deflection signals, from information regarding scanning beam positions for a plurality of intersections of said beams with said holes, whereby the electron image impinging on said article will be aligned with respect to said reference holes when said first region on said photocathode is illuminated.
Claim 2
Dependent Claim
196 words
An electron image alignment system for use with a photocathode haVing a first region for projection of at least one electron image thereon and having at least two second regions for projection of reference electron beams therefrom, and an article on which the image is to be projected having alignment holes in substantially the same pattern as said second regions, comprising: means for illuminating said second regions of said photocathode so as to cause photoemission of electrons therefrom; means for accelerating electrons emitted from said second regions toward said article; deflection means for deflecting said beams and said electron image responsive to a deflection signal; sensing means for sensing the passage of each of said beams through said alignment holes; and means coupled to said deflection means and said sensing means for controlling said deflection means and for determining the position of the centers of said alignment holes, in terms of deflection signals, from information regarding scanning beam positions for a plurality of intersections of said beams with said holes, whereby the electron image impinging on said article will be aligned with respect to said reference holes when said first region on said photocathode is illuminated.
Claim 3
Dependent Claim
83 words
The system of claim 1 further comprised of an interface means coupled to said sensing means for indicating the intersection of the sweep of each of said beams with the edge of said alignment holes, said means coupled to said scanning means and said sensing means being coupled to said sensing means through said interface means whereby the centers of said alignment holes may be determined from the scanning beams positions for a plurality of beam intersections with the edge of said holes.
Claim 4
Independent Claim
162 words
A method of aligning an electron image to be emitted by a photocathode mask with respect to alignment holes in an article on which the electron image is to be projected comprising: a. illuminating a portion of said photocathode mask to cause reference electron beams to be projected from the photocathode mask toward the alignment holes in said article and causing said beams to scan said holes, using electron beams having an annular area characterized by a high average intensity adjacent the inner diameter of said annular area which is smaller than the nominal diameter of said alignment holes, and a low average intensity adjacent the outer diameter of said annular area which is larger than the nominal diameter of said alignment holes, b. sensing the passage of said electron beams through said holes by sensors, c. determining from the information sensed in step (b) the scan position which causes said beams to be aligned with the center of said alignment holes.
Claim 5
Independent Claim
162 words
A method of aligning an electron image to be emitted by a photocathode mask with respect to alignment holes in an article on which the electron image is to be projected comprising: a. illuminating a portion of said photocathode mask to cause reference electron beams to be projected from the photocathode mask toward the alignment holes in said article and causing said beams to scan said holes, using electron beams having an annular area characterized by a high average intensity adjacent the inner diameter of said annular area which is smaller than the nominal diameter of said alignment holes, and a low average intensity adjacent the outer diameter of said annular area which is larger than the nominal diameter of said alignment holes, b. sensing the passage of said electron beams through said holes by sensors, c. determining from the information sensed in step (b) the scan position which causes said beams to be aligned with the center of said alignment holes.
Claim 6
Dependent Claim
78 words
The method of claim 3 wherein said electron beams are caused to scan in two directions a fraction of the diameter of said alignment holes and the scan position which causes said beams to be aligned with the centers of said alignment holes in determined by changing the center position of the beam scans until the magnitude of the beams passing through said alignment holes sensed by said sensors adjacent each end of said scans are substantially equal.
Claim 7
Dependent Claim
32 words
The method of claim 4 wherein a first scan length is used for rough alignment and a second scan length substantially less than said first scan length is used for final alignment.
Claim 8
Independent Claim
147 words
A method of aligning an electron image to be emitted by a photocathode mask with respect to alignment holes in an article on which the electron image is to be projected comprising: a. illuminating a first portion of the photocathode mask to cause reference electron beams to be projected from the photocathode mask generally toward the alignment holes in said article, b. causing said beams to scan said holes by control of a deflection signal applied to a deflection means, c. sensing the passage of said electron beams through said holes by sensors, d. determining from the information sensed in step (c) deflection signals which cause said beams to be aligned with the Centers of said alignment holes, e. illuminating a second portion of the photocathode mask to cause the electron image to be projected onto said article while maintaining the deflection signal determined in step (d).
Claim 9
Independent Claim
147 words
A method of aligning an electron image to be emitted by a photocathode mask with respect to alignment holes in an article on which the electron image is to be projected comprising: a. illuminating a first portion of the photocathode mask to cause reference electron beams to be projected from the photocathode mask generally toward the alignment holes in said article, b. causing said beams to scan said holes by control of a deflection signal applied to a deflection means, c. sensing the passage of said electron beams through said holes by sensors, d. determining from the information sensed in step (c) deflection signals which cause said beams to be aligned with the Centers of said alignment holes, e. illuminating a second portion of the photocathode mask to cause the electron image to be projected onto said article while maintaining the deflection signal determined in step (d).
Claim 10
Dependent Claim
152 words
An electron image alignment system comprising: scanning means for scanning with beams at least two alignment holes in the article on which the image is to be projected; sensing means for sensing the passage of each of said beams through said alignment holes and providing an output signal responsive thereto; means coupled to said scanning means and said sensing means for determining the electron image alignment with respect to said holes from information regarding scanning beam position and sensing means output signal; and said beams being confined to a substantially annular area having an inner diameter less than the nominal diameter of said alignment holes and an outer diameter greater than the nominal diameter of said alignment holes, said beams being characterized as having a high average intensity in the area adjacent said inner diameter, which decreases with increasing diameter to a low average intensity in the area adjacent said outer diameter.
Claim 11
Dependent Claim
152 words
An electron image alignment system comprising: scanning means for scanning with beams at least two alignment holes in the article on which the image is to be projected; sensing means for sensing the passage of each of said beams through said alignment holes and providing an output signal responsive thereto; means coupled to said scanning means and said sensing means for determining the electron image alignment with respect to said holes from information regarding scanning beam position and sensing means output signal; and said beams being confined to a substantially annular area having an inner diameter less than the nominal diameter of said alignment holes and an outer diameter greater than the nominal diameter of said alignment holes, said beams being characterized as having a high average intensity in the area adjacent said inner diameter, which decreases with increasing diameter to a low average intensity in the area adjacent said outer diameter.
Claim 12
Dependent Claim
48 words
The image alignment system of claim 7 wherein each of said beams is comprised of a plurality of approximately triangular shaped beam areas adjacently disposed with their bases defining said inner diameter of said annular area and their apexes together defining the outer diameter of said annular area.
Claim 13
Dependent Claim
13 words
The image alignment system of claim 7 wherein said beams are electron beams.
Claim 14
Dependent Claim
13 words
The image alignment system of claim 7 wherein said beams are light beams.
Claim 15
Dependent Claim
52 words
The image alignment system of claim 7 wherein said scanning means is a means for scanning each of said alignment holes in at least two directions with a scan length which is decreased from a maximum scan length for rough scanning and aligning to a substantially shorter scan length for final alignment.
Claim 16
Dependent Claim
67 words
The image alignment system of claim 11 wherein said means coupled to said scanning means and said sensing means for determining the electron image alignment is a means for comparing the sensing means signals occurring near the ends of each scan and for changing the average position of said scan to cause said sensing means signals occurring near the ends of each scan to be substantially equal.
Claim 17
Dependent Claim
35 words
The electron image alignment system of claim 7 wherein said beams are electron beams and said scanning means comprises an electron deflection means for translating said beams and for rotating said beams about an axis.
Claim 18
Dependent Claim
17 words
The electron image alignment system of claim 13 wherein said deflection means is an electromagnetic deflection means.
Claim 19
Dependent Claim
56 words
The electron image alignment system of claim 7 wherein said beams are electron beams and said scanning means comprises a deflection means for translating the impingement of said electron beams and a means for mechanically causing relative rotation between the source of said electron beams and said article on which the image is to be projected.
Claim 20
Dependent Claim
170 words
An electron image alignment system for aligning a projected electron image comprising: means for causing at least two electron beams aligned with an electron image projection means to be directed toward the surface of an article on which as electron image is to be projected said article having at least two alignment holes therethrough; means responsive to deflection signals for deflecting said electron beams in a controllable manner, said last named means also being operative to deflect a projected electron image accordingly; sensing means located under said alignment holes for determining the passage of each of said electron beams through a corresponding one of said alignment holes; and means coupled to said sensing means and to said means responsive to deflection signals for generating deflection signals to cause said electron beams to scan the regions of said article having said alignment holes therein, aNd for determining the positions of said alignment holes in terms of deflection signals from the scan positions for the intersection of said beams with said holes.
Claim 21
Dependent Claim
170 words
An electron image alignment system for aligning a projected electron image comprising: means for causing at least two electron beams aligned with an electron image projection means to be directed toward the surface of an article on which as electron image is to be projected said article having at least two alignment holes therethrough; means responsive to deflection signals for deflecting said electron beams in a controllable manner, said last named means also being operative to deflect a projected electron image accordingly; sensing means located under said alignment holes for determining the passage of each of said electron beams through a corresponding one of said alignment holes; and means coupled to said sensing means and to said means responsive to deflection signals for generating deflection signals to cause said electron beams to scan the regions of said article having said alignment holes therein, aNd for determining the positions of said alignment holes in terms of deflection signals from the scan positions for the intersection of said beams with said holes.
Claim 22
Dependent Claim
86 words
The system of claim 16 further comprised of an interface means coupled to said sensing means for indicating the intersection of the sweep of each of said beams with the edge of said alignment holes, said means coupled to said sensing means and said means responsive to deflection signals being coupled to said sensing means through said interface means, whereby the position of said alignment holes may be determined from the scanning beam positions for a plurality of beam intersections with the edge of said holes.
Claim 23
Dependent Claim
219 words
An electron image alignment system for aligning an electron image on an article with respect to alignment holes in the article comprising: a photocathode mask adapted to emit an electron image when illuminated in a first area and to emit electron beams when illuminated in a second area, said electron beams having an inner diameter less then the nominal diameter of said alignment holes and outer diameter greater than the nominal diameter of said alignment holes, said beams being characterized by a high average intensity in the area adjacent said inner diameter which decreases with increasing diameter to a low average intensity in the area adjacent said outer diameter; a sensor located below each of said alignment holes responsive to the intensity of an electron beam passing therethrough caused by illumination of said photocathode mask in said second area; beam control means for causing relative translation and rotation of the pattern of said electron beams with respect to said article; and means coupled to each said sensor and to said beam control means to cause said electron beams to scan said alignment holes in a pre-determined manner and to determine the relative position of said article and said electron beams so that the center of scan of said electron beams is coincident with the center of said alignment holes.
Claim 24
Dependent Claim
219 words
An electron image alignment system for aligning an electron image on an article with respect to alignment holes in the article comprising: a photocathode mask adapted to emit an electron image when illuminated in a first area and to emit electron beams when illuminated in a second area, said electron beams having an inner diameter less then the nominal diameter of said alignment holes and outer diameter greater than the nominal diameter of said alignment holes, said beams being characterized by a high average intensity in the area adjacent said inner diameter which decreases with increasing diameter to a low average intensity in the area adjacent said outer diameter; a sensor located below each of said alignment holes responsive to the intensity of an electron beam passing therethrough caused by illumination of said photocathode mask in said second area; beam control means for causing relative translation and rotation of the pattern of said electron beams with respect to said article; and means coupled to each said sensor and to said beam control means to cause said electron beams to scan said alignment holes in a pre-determined manner and to determine the relative position of said article and said electron beams so that the center of scan of said electron beams is coincident with the center of said alignment holes.
Claim 25
Dependent Claim
68 words
The electron image alignment system of claim 18 wherein said means coupled to each said sensor and to said beam control means to cause said electron beams to scans said alignment holes is a means for mechanically rotating said photocathode mask with respect to said article and an electromagnetic means for causing substantially linear translation of said electron beams and said electron image with respect to said article.
Claim 26
Dependent Claim
76 words
The electron image alignment system of claim 19 wherein said means coupled to each said sensor and to said beam control means to cause said electron beams to scan said alignment holes comprises a means to cause said electron beams to scan said alignment holes in at least two directions with a scan length which is decreased from a maximum scan length for rough scanning and aligning to a substantially shorter scan length for final alignment.
Claim 27
Dependent Claim
54 words
The electron image alignment system of claim 20 wherein said last named means further comprises a means for comparing the sensor signals occurring near the ends of each scan and for changing the average position of said scan to cause said sensor signals occurring near the ends of each scan to be substantially equal.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-07-09 | 1977-01-08 | 1977-07-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-07-09 | 1981-01-08 | 1981-07-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-07-09 | 1985-01-08 | 1985-07-10 | $7700.00 | Window Closed / Lapsed |