Vacuum chuck assembly for semiconductor manufacture
Abstract
Abstract Apparatus for fabricating a dielectrically isolated semiconductor structure which includes a vacuum chuck assembly for use with a grinding machine with means for supplying a vacuum to the vacuum chuck. The vacuum chuck assembly consists of a body with a bore provided in the body and adapted to be connected to the source of vacuum. The body has a surface with a plurality of vacuum chucks carried thereby. The body and the vacuum chucks are formed with holes and passages which establish communication with the bore in the body so that a vacuum is supplied to the inserts whereby wafers from which the dielectrically isolated semiconductor structures are to be formed can be supported by and retained by the vacuum chucks. The apparatus also includes a wafer mounting jig which consists of a body having an annular recess therein opening through one side of the body. A flexible diaphragm extends over the annular recess and a cover plate is provided for securing the diaphragm to the body. The cover plate is formed with a plurality of holes overlying the recess and the diaphragm. A relatively noncompressible liquid fills the recess. A plurality of wafer mounting blocks are inserted in the recesses. Means is provided for yieldably retaining the blocks in the body whereby when a force is applied to one of the bodies, equalizing forces will be supplied by the liquid to the other mounting blocks so that all the mounting blocks are forced outwardly by the liquid by substantially equal forces. The apparatus also includes a mounting press which consists of a plate which is provided with means for cooling and heating the plate. A wafer guide member is provided which has a plurality of holes therein. Means is provided for mounting the guide member on the plate to permit vertical movement of the guide member relative to the plate. A plurality of mounting blocks are mounted in the holes. Each of the mounting blocks is adapted to receive a wafer. A bonding material such as wax is provided on the mounting blocks and pressure plate means is provided for applying pressure to the wafers so that the bonding agent will be uniformly and thinly distributed between each wafer and the associated mounting block. The method for fabricating a dielectrically isolated semiconductor structure consists of providing a semiconductor body with a first polished planar surface and then covering this polished surface with a protective material which has a substantially uniform thickness over the polished surface. The semiconductor body with the protected polished surface is then mounted on the vacuum chuck assembly with the polished surface facing the vacuum chuck assembly. The vacuum chuck assembly is then placed in a grinding machine and a second planar surface is provided which is parallel to the first polished surface to provide a semiconductor body of the desired thickness. Conventional steps are thereafter utilized to provide the dielectrically isolated semiconductor structure.
Inventors
- 👤 A Youmans
- 👤 L Saratoga
Bibliographic Details
Claims Analysis
Total Claims: 7References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-06-25 | 1976-12-25 | 1977-06-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-06-25 | 1980-12-25 | 1981-06-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-06-25 | 1984-12-25 | 1985-06-26 | $7700.00 | Window Closed / Lapsed |