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US3738926A
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US
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Method and apparatus for controlling the electrical properties of sputtered films
Assignee: Bell Canada Inc
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Filing: 1972-03-28
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Granted: 1973-06-12
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Expires: 1992-03-28
Abstract
Abstract A METHOD AND APPARATUS FOR MONITORING THE SPUTTERING OF FILMS BY MEASURING THE INTENSITY OF EMISSION OF TWO WAVELENGTHS IN THE LIGHT EMITTED BY THE PLASMA OR GLOW DISCHARGE IN THE SPUTTERING CHAMBER. TWO EMISSION WAVELENGTHS ARE CHOSEN WHICH HAVE A RELATIONSHIP WHICH ARE INDICATIVE OF SPUTTERING CONDITIONS AND ARE RELATED TO THE PARTICULAR ELECTRICAL PROPERTY OF THE FILM RO BE CONTROLLED. FOR EXAMPLE, THE EMISSION FOR NITROGEN AND ARGON ARE LUSED FOR THE CONTROL OF THE RESISTANCE OF A TANTALUM FILM, THE SUPPLY OF NITROGEN CONTROLLED TO MAINTAIN A PREDETERMINED RELATIONSHIP BETWEEN THE EMISSIONS FOR NITROGEN AND ARGON.
Inventors
- 👤 W Westwood
- 👤 R Boynton
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 15:15
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/0021; C23C14/0036; C23C14/0042
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-06-11 | 1976-12-11 | 1977-06-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-06-11 | 1980-12-11 | 1981-06-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-06-11 | 1984-12-11 | 1985-06-12 | $7700.00 | Window Closed / Lapsed |