Patent US3737343A successfully refreshed from Google Patents.
US3737343A
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US
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Technique for the preparation of ion implanted tantalum-aluminum alloy
Assignee: AT&T Inc
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Filing: 1971-04-19
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Granted: 1973-06-05
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Expires: 1991-04-19
Abstract
Abstract A TECHNIQUE FOR THE PREPARATION OF TANTALUM-ALUMINUM ALLOY FILMS MANIFESTING RESISTIVITIES WITHIN THE RANGE OF 10-**3 TO 10-**2 OHM-CENTIMETERS WHICH ARE STABLE AT TEMPERATURES OF THE ORDER OF 400*C. INVOLVES DEPOSITING TANTALUM-ALUMINUM ALLOY FILMS BY CONVENTIONAL CONDENSATION TECHNIQUES, IMPLANTING NITROGEN OR OXYGEN IONS IN THE DEPOSITED FILM AND ANNEALING THE RESULTANT ASSEMBLY. THE FILMS SO PRODUCED ARE THE FIRST HIGH RESISTIVITY FILMS TO BE MADE AVAILABLE FOR USE IN THE FABRICATION OF SEMICONDUCTOR DEVICES WHICH ARE NORMALLY SUBJECTED TO TEM- PERATURES RANGING UP TO 100*V. DURING THE PROCESSING SEQUENCE WHICH MANIFEST SUPERIOR STABILITY CHARACTERISTICS.
Inventors
- 👤 H Basseches
- 👤 D Gerstenberg
- 👤 M Lepselter
- 👤 A Macrae
- 👤 J Schoen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 04:05
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/14; C23C14/22; C23C14/48; C23C14/58; C23C14/5806; C23C14/5826; C23C14/5833; H; H01; H01C; H01C17/00; H01C17/06; H01C17/075; H01C17/12; H10; H10D; H10D84/00; H10D84/01
Claims Analysis
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References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-06-04 | 1976-12-04 | 1977-06-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-06-04 | 1980-12-04 | 1981-06-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-06-04 | 1984-12-04 | 1985-06-05 | $7700.00 | Window Closed / Lapsed |