Patent US3727620A successfully refreshed from Google Patents.
US3727620A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Rinsing and drying device
Assignee: FLUOROWARE OF CALIFORNIA Inc
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Filing: 1970-03-18
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Granted: 1973-04-17
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Expires: 1990-03-18
Abstract
Abstract An automatic rinsing and drying device for batch processing of thin wafers such as those used as microelectronic substrates and the like. The wafers are supported in a carrier basket on a rotating member during a programmed cycle of a sprayed rinsing with deionized water and a high speed spin drying sequence during a continuous dry nitrogen purge. The duration of the rinse and drying sequences are independently timed and the speed of revolution during the drying sequence is independently adjustable to suit each batch. The rotating member is encircled by a double walled tub and a hinged lid during the processing cycle. Spray nozzles are positioned over the wafers to apply the rinsing fluid over the faces of the wafers as they rotate thereunder. The tub is Teflon lined and has multiple drain outlets to remove the spent rinse fluid from the cleansed wafer surfaces. Provision is also made for substitution of different sized rotary members to accommodate various basket sizes and wafer loads.
Inventors
- 👤 R Orr
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 15:23
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; Y; Y10; Y10S; Y10S134/00; Y10S134/902
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
176 words
A rinsing and drying device for batch processing of thin wafers and the like wherein the wafers are carried in a basket with their faces in a radial orientation about a central axis comprising: a. a rotary member supporting the basket for rotation about said central axis; b. spray devices positioned adjacent the rotary member and adapted to supply cleansing and purging fluids over the faces of the wafers; c. a tub encircling the rotary member and defining a chamber containing the rotary member and basket and having drain openings for passage of the spent fluids; and d. separate and independently adjustable control devices cooperating to control the passage of the fluids to the spray devices and the rotation of the rotary member including: 1. a rinsing sequence timer to control the duration of flow of a cleansing fluid to the spray device; 2. a drying sequence timer to control the duration of a drying cycle; and 3. a speed control device to control the speed of revolution of the rotary member during the drying cycle.
Claim 2
Dependent Claim
176 words
A rinsing and drying device for batch processing of thin wafers and the like wherein the wafers are carried in a basket with their faces in a radial orientation about a central axis comprising: a. a rotary member supporting the basket for rotation about said central axis; b. spray devices positioned adjacent the rotary member and adapted to supply cleansing and purging fluids over the faces of the wafers; c. a tub encircling the rotary member and defining a chamber containing the rotary member and basket and having drain openings for passage of the spent fluids; and d. separate and independently adjustable control devices cooperating to control the passage of the fluids to the spray devices and the rotation of the rotary member including: 1. a rinsing sequence timer to control the duration of flow of a cleansing fluid to the spray device; 2. a drying sequence timer to control the duration of a drying cycle; and 3. a speed control device to control the speed of revolution of the rotary member during the drying cycle.
Claim 3
Dependent Claim
13 words
a drying sequence timer to control the duration of a drying cycle; and
Claim 4
Dependent Claim
13 words
a drying sequence timer to control the duration of a drying cycle; and
Claim 5
Dependent Claim
53 words
The device as in claim 1 and wherein the rotary member is formed to provide a complementary socket to the periphery of the basket, a drive shaft removably carrying the rotary member to permit substitution of different sizes of rotary members to accommodate different size baskets and ensure close confinement of each basket.
Claim 6
Dependent Claim
56 words
The device as in claim 2 and in which said basket has a rod-like handle slidable in a central hub and wherein said drive shaft has a bore therein formed to accept said handle in confining relation to support the handle during the spin cycle and said bore forming a drain outlet for said spent fluids.
Claim 7
Dependent Claim
18 words
a speed control device to control the speed of revolution of the rotary member during the drying cycle.
Claim 8
Dependent Claim
18 words
a speed control device to control the speed of revolution of the rotary member during the drying cycle.
Claim 9
Dependent Claim
51 words
The device as in claim 1 and wherein said tub has a spaced double wall construction with an inner wall having a plurality of perforations forming passages to the interjacent area such that the spent fluids are isolated from the area of the wafers and ensures against recontaminating the cleansed wafers.
Claim 10
Dependent Claim
32 words
The device of claim 4 wherein the inner surface of the inner tub is coated with a plastic having a low coefficient of friction to facilitate the removal of the spent fluids.
Claim 11
Dependent Claim
48 words
The device of claim 1 wherein said tub cooperates with an overlying hinged lid to form the chamber in which the rotary member and wafer basket are housed and wherein a dry nitrogen gas emitted through said spray device facilitates purging the chamber of the spent cleansing fluid.
Claim 12
Dependent Claim
33 words
The device as described in claim 1 wherein said rotary member has a centrifugal mass greater than the centrifugal mass of said rotated wafers such to dampen any unbalanced loadings of said wafers.
Claim 13
Dependent Claim
56 words
The device of claim 1 wherein said spray devices include a dry nitrogen gas inlet positioned above and adjacent said central axis of the rotary member and a plurality of cleansing fluid inlets are positioned above the path of the wafers and directed to stream the cleansing fluid over the faces of the wafers passing thereunder.
Claim 14
Dependent Claim
35 words
The device of claim 1 wherein said purging fluid is a dry nitrogen gas emitted continuously during the rinsing and drying sequences to provide an inert blanket over the wafers during the entire processing period.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-04-16 | 1976-10-16 | 1977-04-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-04-16 | 1980-10-16 | 1981-04-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-04-16 | 1984-10-16 | 1985-04-17 | $7700.00 | Window Closed / Lapsed |