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US3715249A Expired / Lapsed US ⏱️ 0.0 years remaining

Etching si3n4

Assignee: AT&T Inc
•
Filing: 1971-09-03
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Granted: 1973-02-06
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Expires: 1991-09-03
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Abstract

Abstract THE SPECIFICATION DESCRIBES A PROCESS FOR ETCHING SILICON NITRIDE IN THE PRESENCE OF SILICONE. IT HAS BEEN FOUND THAT SILICON, ESPECIALLY WHEN HIGHLY DOPED, IS ATTACHED BY THE NORMAL PHOSPHORIC ACID ETCHANT FOR SI3N4. THE ADDITION OF H2SO4 TO THE PHOSPHORIC ACID PREVENTS THE ATTACK OF SILICON.

Inventors

  • 👤 P Panousis
  • 👤 H Waggener

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 15:01
CPC Classifications
C; C09; C09K; C09K13/00; C09K13/04; H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; Y; Y10; Y10S; Y10S148/00; Y10S148/043; Y10S148/051; Y10S148/114

Claims Analysis

Total Claims: 0
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References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1976-02-06 1976-08-07 1977-02-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1980-02-06 1980-08-07 1981-02-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1984-02-06 1984-08-07 1985-02-06 $7700.00 Window Closed / Lapsed

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