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Patent US3712816A successfully refreshed from Google Patents.
US3712816A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for making hard surface transparent mask
Assignee: Fairchild Semiconductor Corp
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Filing: 1970-10-29
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Granted: 1973-01-23
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Expires: 1990-10-29
Abstract
Abstract A MASK COMPRISING A HARD SURFACE LAYER FORMED INTO A DESIRED PATTERN IS PROVIDED FOR USE IN PHOTO FABRICATION. THE LAYER IS VISUALLY TRANSPARENT BUT OPAQUE TO THE RANGE OF WAVE LENGTHS USED TO EXPOSE THE PHOTOPOLYMER ON THE PART BEING PHOTO FABRICATED.
Inventors
- 👤 E Blome
- 👤 S Fok
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 10:46
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54; C; C03; C03C; C03C17/00; C03C17/22; C03C17/23; C03C17/245; C03C2217/00; C03C2217/20; C03C2217/21; C03C2217/213; C03C2218/00; C03C2218/10; C03C2218/15; C03C2218/151; C03C2218/30; C03C2218/32; C03C2218/328
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-01-23 | 1976-07-24 | 1977-01-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-01-23 | 1980-07-24 | 1981-01-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-01-23 | 1984-07-24 | 1985-01-23 | $7700.00 | Window Closed / Lapsed |