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US3702787A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of forming ohmic contact for semiconducting devices

Assignee: Motorola Solutions Inc
•
Filing: 1970-11-02
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Granted: 1972-11-14
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Expires: 1990-11-02
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Abstract

Abstract THERE IS DISCLOSED AN OHMIC CONTACT FOR SILCON SEMICONDUCTING DEVICES IN WHICH THE SILICON IS OVERLAYED WITH A THIN FILM OF NICKEL-CHROMIUM FOLLOWED BY A THIN FILM OF NICKEL-CHROMIUM-SILVER OVER WHICH IS DEPOSITED A THICK FILM OF SILVER TO COMPLETE THE OHMIC CONTACT. A METHOD FOR FABRICATING THE OHMIC CONTACT IS ALSO DISCLOSED.

Inventors

  • 👤 Robert Arthur Lowry Jr
  • 👤 Billy Eual Smith

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 01:27
CPC Classifications
H; H10; H10P; H10P95/00; H10P95/50; Y; Y10; Y10S; Y10S148/00; Y10S148/02; Y10S438/00; Y10S438/928; Y10S438/964

Claims Analysis

Total Claims: 0
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References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1975-11-14 1976-05-15 1976-11-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1979-11-14 1980-05-15 1980-11-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1983-11-14 1984-05-15 1984-11-14 $7700.00 Window Closed / Lapsed

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