Patent US3681036A successfully refreshed from Google Patents.
US3681036A
Expired / Lapsed
US
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Method of making silicon halides
Assignee: Evonik Operations GmbH
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Filing: 1970-08-18
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Granted: 1972-08-01
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Expires: 1990-08-18
Abstract
Abstract SILICON HALIDES ARE FORMED IN A CONTINUOUS PROCESS BY REACTING SILICON OR A SILICON-CONTAINING COMPOUND WITH HYDROGEN HALIDE AT A TEMPERATURE BETWEEN 350 AND 1200*C. THE SILICON HALIDE IS THEN RECOVERED AND THE HYDROGEN FORMED IN THE REACTION IS RECYCLED IN AN AMOUNT TO PROVIDE A RATIO OF PARTIAL PRESSURES IN THE RE- ACTION MIXTURE BETWEEN HYDROGEN HALIDE AND HYDROGEN IN THE RANGE BETWEEN 1:1 AND 1:50 AT A PREDETERMINED REACTION TEMPERATURE WITHIN THE STATED RANGE.
Inventors
- 👤 Rudolf Schwarz
- 👤 Eugen Meyer-Simon
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 18:11
CPC Classifications
C; C01; C01B; C01B33/00; C01B33/113
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1975-08-01 | 1976-01-31 | 1976-08-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1979-08-01 | 1980-01-31 | 1980-08-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1983-08-01 | 1984-01-31 | 1984-08-01 | $7700.00 | Window Closed / Lapsed |