Contactless mask pattern exposure process and apparatus system having virtual extended depth of focus

Claim 1

A method of providing virtual extended depth of focus for a holographic exposure system comprising the steps of: a. directing a coherent source or radiation at a substantially thick, three-dimensional mask having at least one radiation transmitting passage, the passage being defined by radiation absorbing or trapping internal surface means and entrance and exit openings so as to expose the entrance opening to a complex wavefront source of radiation comprising a first component part diffracted by the entrance opening and also a second component part passing directly into the passage, the internal surface means absorbing or trapping that portion of the complex wavefront source of both the first and second component parts whose direction does not intercept the internal surface means so as to produce a resultant wavefront, the resultant wavefront comprising a third component part, the third component part comprising that portion of the first and second component parts whose direction does not intercept the internal surface means and any portion diffracted by the exit opening, b. recording the magnitude and phase of the resultant wavefront on a memory means so as to produce a holographic pattern, c. forming a spatial reconstructed radiation pattern from the holographic pattern, the virtual extended depth of focus being manifested by a tunnel of radiation during the step of forming a spatial reconstructed radiation pattern, the tunnel of radiation extending a distance defined by the distance separating the entrance and exit openings, and the crosssectional tunnel area at any plane being defined by the size of the entrance and exit openings, and d. exposing a radiation sensitive means to the spatial reconstructed radiation pattern within the virtual extended depth of focus as defined by the entrance and exit real images.

Claim 2

A method of providing virtual extended depth of focus for a holographic exposure system comprising the steps of: a. directing a coherent source or radiation at a substantially thick, three-dimensional mask having at least one radiation transmitting passage, the passage being defined by radiation absorbing or trapping internal surface means and entrance and exit openings so as to expose the entrance opening to a complex wavefront source of radiation comprising a first component part diffracted by the entrance opening and also a second component part passing directly into the passage, the internal surface means absorbing or trapping that portion of the complex wavefront source of both the first and second component parts whose direction does not intercept the internal surface means so as to produce a resultant wavefront, the resultant wavefront comprising a third component part, the third component part comprising that portion of the first and second component parts whose direction does not intercept the internal surface means and any portion diffracted by the exit opening, b. recording the magnitude and phase of the resultant wavefront on a memory means so as to produce a holographic pattern, c. forming a spatial reconstructed radiation pattern from the holographic pattern, the virtual extended depth of focus being manifested by a tunnel of radiation during the step of forming a spatial reconstructed radiation pattern, the tunnel of radiation extending a distance defined by the distance separating the entrance and exit openings, and the crosssectional tunnel area at any plane being defined by the size of the entrance and exit openings, and d. exposing a radiation sensitive means to the spatial reconstructed radiation pattern within the virtual extended depth of focus as defined by the entrance and exit real images.

Claim 5

The method of forming a photoresist mask pattern in a holographic mask projection system comprising the steps of: a. recording a holographic pattern of a resultant wavefront representing a substantially thick, three-dimensional mask having at least one light transmitting passage, the passage being defined by radiation absorbing or trapping internal surface means and entrance and exit openings by exposing the entrance opening to a complex wavefront source of radiation, the complex wavefront source of radiation comprising a first component part diffracted by the entrance opening and also a second component part passing directly into the passage, the internal surface means absorbing or trapping that portion of the complex wavefront source of both the first and second component parts whose direction does not intercept the internal surface means so as to produce a resultant wavefront, the resultant wavefront comprising a third component part, the third component part comprising that portion of the first and second component parts whose direction does not intercept the internal surface means and any portion diffracted by the exit opening. b. reconstructing a radiation pattern from the holographiC pattern, the radiation pattern including a real image of the entrance and exit openings and a virtual extended depth of focus extending between the entrance and exit openings, the virtual extended depth of focus being manifested by a tunnel of radiation during the step of reconstructing a radiation pattern, the tunnel of radiation extending a distance defined by the distance separating the entrance and exit openings, and the cross-sectional tunnel area at any plane being defined by the size of the entrance and exit openings, c. exposing a photosensitive surface to the reconstructed radiation pattern within the virtual extended depth of focus as defined by the real images of the entrance and exit openings.

Claim 6

The method of forming a photoresist mask pattern in a holographic mask projection system comprising the steps of: a. recording a holographic pattern of a resultant wavefront representing a substantially thick, three-dimensional mask having at least one light transmitting passage, the passage being defined by radiation absorbing or trapping internal surface means and entrance and exit openings by exposing the entrance opening to a complex wavefront source of radiation, the complex wavefront source of radiation comprising a first component part diffracted by the entrance opening and also a second component part passing directly into the passage, the internal surface means absorbing or trapping that portion of the complex wavefront source of both the first and second component parts whose direction does not intercept the internal surface means so as to produce a resultant wavefront, the resultant wavefront comprising a third component part, the third component part comprising that portion of the first and second component parts whose direction does not intercept the internal surface means and any portion diffracted by the exit opening. b. reconstructing a radiation pattern from the holographiC pattern, the radiation pattern including a real image of the entrance and exit openings and a virtual extended depth of focus extending between the entrance and exit openings, the virtual extended depth of focus being manifested by a tunnel of radiation during the step of reconstructing a radiation pattern, the tunnel of radiation extending a distance defined by the distance separating the entrance and exit openings, and the cross-sectional tunnel area at any plane being defined by the size of the entrance and exit openings, c. exposing a photosensitive surface to the reconstructed radiation pattern within the virtual extended depth of focus as defined by the real images of the entrance and exit openings.

Claim 8

A method of providing virtual extended depth of focus for a holographic projection system of a mask comprising the steps of: a. forming a reconstructed radiation pattern from a holographic pattern recording, b. the holographic pattern being recorded on a memory means and representing a substantially thick, three-dimensional mask having at least one radiation transmitting passage formed therethrough, and the passage being defined by radiation absorbing or trapping internal surface means and entrance and exit openings, c. exposing a photosensitive surface means to the reconstructed radiation pattern, the virtual extended depth of focus being manifested by an in-focus tunnel of radiation during the step of exposing a photosensitive surface means, the tunnel of radiation extending a distance defined by the distance separating the entrance and exit openings, and the cross-sectional tunnel area at any plane being defined by the size of the entrance and exit openings, and d. the radiation sensitive means being exposed within a portion of the reconstructed radiation pattern which is defined by the real images of the entrance and exit apertures.

Claim 9

A method of providing virtual extended depth of focus for a holographic projection system of a mask comprising the steps of: a. forming a reconstructed radiation pattern from a holographic pattern recording, b. the holographic pattern being recorded on a memory means and representing a substantially thick, three-dimensional mask having at least one radiation transmitting passage formed therethrough, and the passage being defined by radiation absorbing or trapping internal surface means and entrance and exit openings, c. exposing a photosensitive surface means to the reconstructed radiation pattern, the virtual extended depth of focus being manifested by an in-focus tunnel of radiation during the step of exposing a photosensitive surface means, the tunnel of radiation extending a distance defined by the distance separating the entrance and exit openings, and the cross-sectional tunnel area at any plane being defined by the size of the entrance and exit openings, and d. the radiation sensitive means being exposed within a portion of the reconstructed radiation pattern which is defined by the real images of the entrance and exit apertures.

Claim 17

A method of providing virtual extended depth of focus for a holographic exposure system comprising the steps of: a. directing a coherent source or radiation at a substantially thick, three-dimensional mask having at least one radiation transmitting passage, the passage being defined by radiation absorbing or trapping internal surface means and entrance and exit openings so as to expose the entrance opening to a complex wavefront source of radiation comprising a first component part diffracted by the entrance opening and also a second component part passing directly into the passage, the internal surface means absorbing or trapping that portion of the complex wavefront source of both the first and second component parts whose direction does not intercept the internal surface means so as to produce a resultant wavefront, the resultant wavefront comprising a third component part, the third component part comprising that portion of the first and second component parts whose direction does not intercept the internal surface means and any portion diffracted by the exit opening, and b. recording the magnitude and phase of the resultant wavefront on a memory means so as to provide a stored holographic pattern.

Claim 18

A method of providing virtual extended depth of focus for a holographic exposure system comprising the steps of: a. directing a coherent source or radiation at a substantially thick, three-dimensional mask having at least one radiation transmitting passage, the passage being defined by radiation absorbing or trapping internal surface means and entrance and exit openings so as to expose the entrance opening to a complex wavefront source of radiation comprising a first component part diffracted by the entrance opening and also a second component part passing directly into the passage, the internal surface means absorbing or trapping that portion of the complex wavefront source of both the first and second component parts whose direction does not intercept the internal surface means so as to produce a resultant wavefront, the resultant wavefront comprising a third component part, the third component part comprising that portion of the first and second component parts whose direction does not intercept the internal surface means and any portion diffracted by the exit opening, and b. recording the magnitude and phase of the resultant wavefront on a memory means so as to provide a stored holographic pattern.