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US3674492A Expired / Lapsed US ⏱️ 0.0 years remaining

Laminar photomask

Assignee: AT&T Inc
•
Filing: 1970-12-09
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Granted: 1972-07-04
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Expires: 1990-12-09
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Abstract

Abstract A HIGH SPEED, HIGH RESOLUTION LAMINAR PHOTOMASK IS OBTAINED BY COATING A TRANSPARENT SUBSTRATE MEMBER WITH CHROMIUM OR IRON OXIDE, A PHOTORESIST AND A THIN FILM OF A HIGH RESOLUTION PHOTOGRAPHIC EMULSION HAVING A THICKNESS OF THE ORDER OF 2.0 MICROMETERS. THE RESULTANT PHOTO- MASK IS FOUND TO ENHANCE THE SPEED OF CONVENTIONAL PHOTORESISTS AND TO INCREASE THE EFFECTIVE FIELD OF VIEW OF PROJECTION SYSTEMS BY REDUCING THE REQUIRED IMAGE MODUALTION.

Inventors

  • 👤 Michael Richard Goldrick
  • 👤 Robert Eugene Kerwin
  • 👤 John George Skinner

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 10:51
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/2002; G03F7/2014; G03F7/2016; G03F1/00; G03F1/54

Claims Analysis

Total Claims: 0
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References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1975-07-04 1976-01-03 1976-07-04 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1979-07-04 1980-01-03 1980-07-04 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1983-07-04 1984-01-03 1984-07-04 $7700.00 Window Closed / Lapsed

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