Patent US3661758A successfully refreshed from Google Patents.
US3661758A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Rf sputtering system with the anode enclosing the target
Assignee: HP Inc
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Filing: 1970-06-26
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Granted: 1972-05-09
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Expires: 1990-06-26
Abstract
Abstract The plasma in an RF sputtering system is confined to the region between the anode and target by enclosing the target with the anode. The anode is in two parts which are connected electrically through sliding contacts that allow removal of one of the parts for access to the interior region of the anode.
Inventors
- 👤 Weldon H Jackson
- 👤 Billie J Robison
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 19:50
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1975-05-09 | 1975-11-08 | 1976-05-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1979-05-09 | 1979-11-08 | 1980-05-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1983-05-09 | 1983-11-08 | 1984-05-09 | $7700.00 | Window Closed / Lapsed |