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US3661117A Expired / Lapsed US ⏱️ 0.0 years remaining

Apparatus for depositing thin lines

Assignee: SRI International Inc
•
Filing: 1969-12-03
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Granted: 1972-05-09
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Expires: 1989-12-03
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Abstract

Abstract An apparatus for depositing thin lines of conducting, semiconducting or dielectric material on a substrate including a crucible having a vaporizable material charge receiving chamber and a vapor chamber. A first tube for introducing a flow of carrier gas and a heated capillary tube penetrate the vapor compartment. On heating the crucible to a temperature above the evaporation temperature of the charge, the charge evaporates and is pushed through the capillary tube by the carrier gas. The stream of carrier gas and vapor deposits dots or lines on the target. Patterns are produced by translating the target with respect to the crucible.

Inventors

  • 👤 William L Cornelius
  • 👤 John G Martner

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 23:10
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/228; C23C14/04; C23C14/24; C23C14/243

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 176 words
A system for depositing a fine line of conducting, dielectric or semi-conducting material on a substrate comprising: a closed crucible having a charge receiving chamber and a vapor chamber, a wall of said crucible defining a first aperture; a partition means forming a common wall structure between said chambers and including means therein communicating said charge receiving and vapor chambers; first heating means for maintaining said chambers at a temperature above the evaporation temperature of said material; an elongated small diameter barrel means inserted through the aperture, the barrel having an internal diameter below 20 mils, a first end communicating with the vapor chamber and a second end terminating in a nozzle; second heating means for heating said barrel to a temperature above the evaporation temperature of the material; substrate support means facing said nozzle, disposed in a plane transverse to the axis of the nozzle and spaced no more than 250 mils from the nozzle; and translation means for moving said support means relative to said nozzle in vertical and horizontal directions within said plane.
Claim 2
Independent Claim 176 words
A system for depositing a fine line of conducting, dielectric or semi-conducting material on a substrate comprising: a closed crucible having a charge receiving chamber and a vapor chamber, a wall of said crucible defining a first aperture; a partition means forming a common wall structure between said chambers and including means therein communicating said charge receiving and vapor chambers; first heating means for maintaining said chambers at a temperature above the evaporation temperature of said material; an elongated small diameter barrel means inserted through the aperture, the barrel having an internal diameter below 20 mils, a first end communicating with the vapor chamber and a second end terminating in a nozzle; second heating means for heating said barrel to a temperature above the evaporation temperature of the material; substrate support means facing said nozzle, disposed in a plane transverse to the axis of the nozzle and spaced no more than 250 mils from the nozzle; and translation means for moving said support means relative to said nozzle in vertical and horizontal directions within said plane.
Claim 3
Dependent Claim 21 words
A deposition system according to claim 1 in which the internal diameter of said barrel is from 1 to 10 mils.
Claim 4
Dependent Claim 17 words
A deposition system according to claim 2 in which said barrel is formed of a refractory material.
Claim 5
Dependent Claim 28 words
A deposition system according to claim 1 in which said first and second heating means each comprise a heating filament wound respectively around said crucible and said barrel.
Claim 6
Dependent Claim 18 words
A deposition system according to claim 1 in which the translation means include means for rotating the crucible.
Claim 7
Dependent Claim 58 words
A deposition system according to claim 1 in which the substrate support means includes a substrate clamping means for positioning said support from 10 to 100 mils from the nozzle and said translation means includes means connected to said clamping means for translating the substrate in a horizontal and vertical directions in a plane transverse to the nozzle.
Claim 8
Dependent Claim 19 words
A deposition system according to claim 6 further including shutter means mounted between said nozzle and said support means.
Claim 9
Dependent Claim 240 words
A deposition apparatus for depositing a pattern of fine lines of a conducting, semi-conducting or dielectric material onto a substrate comprising: an elongated, hollow, cylindrical, vapor tight, refractory vessel having first and second vapor tight ends; bearing means connected to each of said ends; rotation means connected to said bearing means for rotating the cylindrical vessel; a plate member having a central aperture mounted across the wall of the vessel intermediate said ends dividing the vessel into a charge receiving compartment and a vapor compartment; a first insulated, electrical heating coil surrounding the vessel for heating the compartments to a temperature above the vaporization temperature of said material; a vapor output barrel having a first portion inserted through the vessel end adjacent the vapor compartment and having a first end terminating in the vapor compartment and a second portion extending from the vessel terminating in a nozzle; a second, insulated, electrical heating coil surrounding the second portion of the barrel for heating the second portioN to at least the vaporization temperature of the material; baffle means mounted within the vapor compartment between the central aperture of the plate member and the first end of the nozzle; substrate support means mounted in a plane transverse to the axis of the vessel facing the nozzle; translation means connected to the support means for translating the support means in said plane; and shutter means disposed between the nozzle and the substrate support means.
Claim 10
Dependent Claim 240 words
A deposition apparatus for depositing a pattern of fine lines of a conducting, semi-conducting or dielectric material onto a substrate comprising: an elongated, hollow, cylindrical, vapor tight, refractory vessel having first and second vapor tight ends; bearing means connected to each of said ends; rotation means connected to said bearing means for rotating the cylindrical vessel; a plate member having a central aperture mounted across the wall of the vessel intermediate said ends dividing the vessel into a charge receiving compartment and a vapor compartment; a first insulated, electrical heating coil surrounding the vessel for heating the compartments to a temperature above the vaporization temperature of said material; a vapor output barrel having a first portion inserted through the vessel end adjacent the vapor compartment and having a first end terminating in the vapor compartment and a second portion extending from the vessel terminating in a nozzle; a second, insulated, electrical heating coil surrounding the second portion of the barrel for heating the second portioN to at least the vaporization temperature of the material; baffle means mounted within the vapor compartment between the central aperture of the plate member and the first end of the nozzle; substrate support means mounted in a plane transverse to the axis of the vessel facing the nozzle; translation means connected to the support means for translating the support means in said plane; and shutter means disposed between the nozzle and the substrate support means.

References Cited (Backward Citations)

US2445310A Cited
US2772518A Cited
US2794418A Cited
US3023491A Cited
US3329524A Cited
US3447951A Cited
US3508402A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1975-05-09 1975-11-08 1976-05-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1979-05-09 1979-11-08 1980-05-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1983-05-09 1983-11-08 1984-05-09 $7700.00 Window Closed / Lapsed

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