Patent US3639151A successfully refreshed from Google Patents.
US3639151A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Vapor randomization in vacuum deposition of coatings
Assignee: RTX Corp
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Filing: 1969-03-13
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Granted: 1972-02-01
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Expires: 1989-03-13
Abstract
Abstract In the processes for forming protective coatings on metal substrates, particularly the nickel-base and cobalt-base superalloys, by deposition in a vacuum, an electrically biased substrate, in conjunction with a sustained plasma discharge between the source and the substrate, is utilized to randomize the coating vapor cloud and allow non-line-of-sight deposition.
Inventors
- 👤 Richard C Krutenat
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 16:04
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/24; C23C14/32; H; H01; H01J; H01J37/00; H01J37/32; H01J37/36
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
21 words
The method of claim 1 wherein the inert gas is admitted at a location adjacent a selected portion of the substrate.
Claim 2
Dependent Claim
11 words
The method of claim 1 wherein the inert gas is argon.
Claim 3
Dependent Claim
20 words
The method of claim 3 wherein said pressure is in the range of 1- 5 X 10 2 mm. Hg.
References Cited (Backward Citations)
US3192892A
Cited
US3230110A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1975-01-31 | 1975-08-02 | 1976-02-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1979-01-31 | 1979-08-02 | 1980-02-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1983-01-31 | 1983-08-02 | 1984-02-01 | $7700.00 | Window Closed / Lapsed |