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Solvent development of light-sensitive diazo layers

Assignee: Howson Algraphy Ltd
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Filing: 1967-05-17
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Granted: 1972-01-11
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Expires: 1987-05-17
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Abstract

Abstract The development of positive-working light-sensitive diazo layers for use as lithographic printing plates and photoresists is effected using selectively acting organic solvents to dissolve light-struck areas.

Inventors

  • 👤 Leslie Edward Lawson
  • 👤 Frank Edward Smith
  • 👤 Peter John Smith

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 15:08
CPC Classifications
B; B41; B41N; B41N3/00; B41N3/08

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 29 words
Process in accordance with claim 1, wherein the developer includes a desensitizer to render hydrophilic the underlying areas of the support revealed on selective removal of the light-struck areas.
Claim 2
Dependent Claim 17 words
Process in accordance with claim 1, wherein the developer is in the form of an aqueous emulsion.
Claim 3
Dependent Claim 29 words
Process in accordance with claim 1, wherein said organic solvent is selected from the group consisting of 2-ethyl-hexanol; 1-octanol; 2,6-dimethyl-4-heptanone; 6-methyl-3-heptanone; 3-methyl-2-pentanone; n-hexyl acetate; diethyl phthalate and diethyl carbonate.
Claim 4
Dependent Claim 21 words
Process in accordance with claim 1, wherein the developer includes a resin which is deposited on the nonlight-struck areas during development.
Claim 5
Dependent Claim 21 words
Process in accordance with claim 5, wherein the resin is selected from the group consisting of novolak resins and epoxy resins.
Claim 6
Dependent Claim 36 words
Process in accordance with claim 1, wherein the developer includes a material selected from the group consisting of dyes and pigments which is deposited on the nonlight-struck areas during development to render said areas more visible.
Claim 7
Dependent Claim 30 words
A process as claimed in claim 1, wherein the developer includes a photodesensitizing dye which is deposited on the nonlight-struck areas during development to render said areas insensitive to light.
Claim 8
Dependent Claim 10 words
Process according to claim 1, wherein said support is metal.
Claim 9
Dependent Claim 27 words
Process according to claim 1, wherein a tough nonphotosensitive layer is interposed between the photosensitive material and the support, said nonphotosensitive layer being soluble in the developer.

References Cited (Backward Citations)

GB784001A Cited
GB844039A Cited
US3019106A Cited
US3406065A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1975-01-10 1975-07-12 1976-01-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1979-01-10 1979-07-12 1980-01-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1983-01-10 1983-07-12 1984-01-11 $7700.00 Window Closed / Lapsed

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