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US3633269A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of making contact to semiconductor devices

Assignee: Telefunken Electronic GmbH
•
Filing: 1969-06-24
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Granted: 1972-01-11
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Expires: 1989-06-24
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Abstract

Abstract The disclosure relates to a method of making contact with semiconductor devices by applying a metal layer, e.g. nickel or aluminum, onto an insulating layer, e.g. silicon dioxide, on the semiconductor material and onto the surface of the semiconductor material itself through windows in the insulating material and removing the part of the metal layer applied to the insulating layer by means of an adhesive strip, the metal layer having been treated, during or after its application, by heat to render it more firmly bonded to the semiconductor material than to the insulating layer.

Inventors

  • 👤 Alfred Bachmeier

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 15:05
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/948; Y10S438/951

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 17 words
A method as defined in claim 1, wherein said metal layer is alloyed to the exposed regions.
Claim 2
Dependent Claim 17 words
A method as defined in claim 1, wherein said metal layer is sintered to said exposed regions.
Claim 3
Dependent Claim 13 words
A method as defined in claim 1, wherein said metal layer is vapor-deposited.
Claim 4
Dependent Claim 13 words
A method as defined in claim 1, wherein said metal layer is electrodeposited.
Claim 5
Dependent Claim 44 words
A method as defined in claim 1, wherein such materials are used for said insulating layer and said metal layer that said metal layer adheres, under heat treatment, better to said regions to which contact is to be made than to the insulating layer.
Claim 6
Dependent Claim 15 words
A method as defined in claim 6, wherein said insulating layer consists of silicon dioxide.
Claim 7
Dependent Claim 22 words
A method as defined in claim 7, wherein said metal layer is a layer of a metal selected from nickel or aluminum.
Claim 8
Dependent Claim 31 words
A method as defined in claim 8, wherein when nickel is used as the material for said metal layer, said heat treatment is effected at a temperature at about 650* C.
Claim 9
Dependent Claim 15 words
A method as claimed in claim 1, wherein said pulloff member is an adhesive tape.

References Cited (Backward Citations)

US3350250A Cited
US3341375A Cited
US3436809A Cited
US3374515A Cited
US3469308A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1975-01-10 1975-07-12 1976-01-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1979-01-10 1979-07-12 1980-01-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1983-01-10 1983-07-12 1984-01-11 $7700.00 Window Closed / Lapsed

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