US3617463A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus and method for sputter etching
Assignee: International Business Machines Corp
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Filing: 1969-06-18
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Granted: 1971-11-02
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Expires: 1989-06-18
Abstract
Abstract The object to be sputter etched is excited in a reduced atmosphere of inert gas by the application of an RF potential across a pair of electrodes, one of which supports the object and is capacitively coupled to the RF source. The improvement is a means to catch and retain material removed by the sputtering operation.
Inventors
- 👤 Lawrence V Gregor
- 👤 Leon I Maissel
- 👤 Charles L Standley
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 09:05
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
23 words
The apparatus of claim 1 wherein said plurality of spaced fin members is comprised of a plurality of concentrically disposed cylindrical shaped fins.
Claim 2
Dependent Claim
23 words
The apparatus of claim 1 wherein said plurality of spaced fin members is comprised of a plurality of concentrically disposed frustoconically shaped fins.
Claim 3
Dependent Claim
42 words
The apparatus of claim 1 wherein said spaced fin members is electrically connected to said radiofrequency voltage and serves, at least in part, as the second electrode. 5 The sputter etching apparatus of claim 1 wherein said catcher means is the anode.
Claim 4
Dependent Claim
128 words
In a sputter etching apparatus including a vacuumtight chamber, a pair of electrodes in the chamber, one of which has a generally flat surface for supporting an object to be sputter etched, means for applying a voltage between the electrodes, the improvement comprising, a material catcher means positioned in spaced relation to the supported object surface and said electrode supporting said object to receive and hold material removed during etching to minimize reemission of material and to minimize contamination of the object being sputter etched, said catcher means having a flat support portion positioned in a plane generally parallel to said electrode for supporting an object, and a plurality of spaced fin members depending therefom positioned between said flat support portion and said electrode for supporting an object.
Claim 5
Dependent Claim
20 words
The sputter etching apparatus of claim 6 wherein said means for applying a voltage is a source of DC voltage.
References Cited (Backward Citations)
US3514391A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-11-01 | 1975-05-03 | 1975-11-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-11-01 | 1979-05-03 | 1979-11-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-11-01 | 1983-05-03 | 1983-11-02 | $7700.00 | Window Closed / Lapsed |