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Production of deposits by cathode sputtering

Assignee: Alsacienne de Constructions Atomiques de Telecommunications et dElectronique ALCATEL
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Filing: 1968-06-21
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Granted: 1971-10-26
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Expires: 1988-06-21
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Abstract

Abstract The invention eliminates the drawbacks of the prior methods for cathode-sputtering deposition by providing basically the use of a substantially neutral plasma adapted to be carried in the form of a stable parallel beam to a substantial distance from the source without resorting to intricate electrode arrangements.

Inventors

  • 👤 Jean Jacques Bessot
  • 👤 Jean Claude Burlurut

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 16:14
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/46; C23C14/35; C23C14/354; C23C14/355

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 29 words
The apparatus of claim 1 wherein filament comprises a helical wire having an axis and wherein axes of the filament, diaphragm opening, cylindrical anode and electromagnetic coil are concurrent.
Claim 2
Dependent Claim 58 words
The apparatus of claim 1 wherein the vacuum vessel comprises a main chamber and a tube opening into the main chamber and extending outward from an open connection therewith, wherein the filament, diaphragm and cylindrical anode are positioned within the tube and wherein the diaphragm opening, cylindrical anode have axes concurrent with a center of the open connection.

References Cited (Backward Citations)

No citation records indexed.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1974-10-25 1975-04-26 1975-10-26 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1978-10-25 1979-04-26 1979-10-26 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1982-10-25 1983-04-26 1983-10-26 $7700.00 Window Closed / Lapsed

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