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US3615205A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for the synthesis and growth of high purity iii{14 v semiconductor compositions in bulk

Assignee: International Business Machines Corp
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Filing: 1968-10-14
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Granted: 1971-10-26
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Expires: 1988-10-14
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Abstract

Abstract Ingots of high purity III-V semiconductor compositions are prepared by encapsulating the molten Group III element with a barrier material that is permeable to the vapors of the Group V element while being impermeable to contaminants inherent in the system such as silicon and the like. The synthesis of the composition may be carried out in a conventional vertical sealed quartz enclosure. A crucible containing the Group III element and a barrier material and the Group V element are disposed within the sealed enclosure. The barrier material acts as a permeable membrane for vapors of the Group V element and as an impermeable membrane, or getter, for contaminants inherent in the system. Thus, vapors of the Group V element is permitted to diffuse through the barrier layer to react with the molten Group III element to form the III-V composition to the exclusion of contaminants. Ingots of highly pure III-V compositions are prepared in this manner.

Inventors

  • 👤 Samuel E Blum
  • 👤 Richard J Chicotka

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 02:58
CPC Classifications
C; C30; C30B; C30B11/00; C30B11/04; C30B11/06; C30B29/00; C30B29/10; C30B29/40; C30B29/42; C30B29/44

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 53 words
An improved method for preparing III-V semiconductor compositions according to claim 1 wherein said Group III element is selected from at least one of the group consisting of Al, Ga, and In and said Group V element is selected from at least one of the group consisting of P, As, Sb and Bi.
Claim 2
Dependent Claim 25 words
An improved method for preparing semiconductor compositions according to claim 1 wherein said group III element is Ga and said Group V element is As.
Claim 3
Dependent Claim 25 words
An improved method for preparing semiconductor compositions according to claim 1 wherein said Group III element is Ga and said Group V element is P.
Claim 4
Dependent Claim 25 words
An improved method for preparing semiconductor compositions according to claim 1 wherein said Group III element is In and said Group V element is As.
Claim 5
Dependent Claim 25 words
An improved method for preparing semiconductor compositions according to claim 1 wherein said Group III element is In and said Group V element is P.
Claim 6
Dependent Claim 27 words
An improved method for preparing semiconductor compositions according to claim 1 wherein said Group III elements are Ga and Al and said Group V element is As.
Claim 7
Dependent Claim 27 words
An improved method for preparing semiconductor compositions according to claim 1 wherein said Group III elements are Ga and A1 and said Group V element is P.
Claim 8
Dependent Claim 17 words
An improved method for preparing semiconductor compositions according to claim 1 wherein said barrier material is B2O3.
Claim 9
Dependent Claim 26 words
An improved method for preparing semiconductor compositions according to claim 1 wherein the pressure of said Group V element is maintained between 1 to 25 atmospheres.
Claim 10
Dependent Claim 25 words
An improved method for preparing semiconductor compositions according to claim 1 wherein the pressure of said Group V element is maintained at about 10 atmospheres.

References Cited (Backward Citations)

US3305313A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1974-10-25 1975-04-26 1975-10-26 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1978-10-25 1979-04-26 1979-10-26 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1982-10-25 1983-04-26 1983-10-26 $7700.00 Window Closed / Lapsed

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