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US3610125A Expired / Lapsed US ⏱️ 0.0 years remaining

Apparatus for producing photolithographic structures,particularly on semiconductor crystal surfaces

Assignee: Siemens AG
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Filing: 1969-10-29
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Granted: 1971-10-05
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Expires: 1989-10-29
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Abstract

Abstract APPARATUS WHEREIN A LIGHT-SENSITIVE LAYER APPLIED TO A SURFACE THAT IS TO BE PHOTOLITHOGRAPHICALLY PROCESSED IS EXPOSED IN ACCORDANCE WITH AN ORIGINAL CORRESPONDING TO THE GEOMETRICAL FORM TO BE PRODUCED ON THE SURFACE, THE EXPOSED PHOTOSENSITIVE LAYER IS DEVELOPED SO THAT A COPY OF THE CORRESPONDING ORIGINAL, PREFERABLY REDUCED IN SIZE, IS PRODUCED ON THE LAYER. THE ORIGINAL IS TRACED WITH A SENSING DEVICE, AND THE PATH TAKEN BY THE SENSING DEVICE OVER THE ORIGINAL IS USED FOR PRODUCING THE MOVEMENT OF AN EXPOSURE MARK TO DESCRIBE A PATH GEOMETRICALLY SIMILAR TO THAT OF THE SENSING DEVICE ON THE LIGHT-SENSITIVE LAYER.

Inventors

  • 👤 Wolfgang Touchy

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 22:42
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70383; G03F7/704; H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; H10P76/2042

Claims Analysis

Total Claims: 0
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References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1974-10-04 1975-04-05 1975-10-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1978-10-04 1979-04-05 1979-10-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1982-10-04 1983-04-05 1983-10-05 $7700.00 Window Closed / Lapsed

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