US3610125A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for producing photolithographic structures,particularly on semiconductor crystal surfaces
Assignee: Siemens AG
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Filing: 1969-10-29
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Granted: 1971-10-05
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Expires: 1989-10-29
Abstract
Abstract APPARATUS WHEREIN A LIGHT-SENSITIVE LAYER APPLIED TO A SURFACE THAT IS TO BE PHOTOLITHOGRAPHICALLY PROCESSED IS EXPOSED IN ACCORDANCE WITH AN ORIGINAL CORRESPONDING TO THE GEOMETRICAL FORM TO BE PRODUCED ON THE SURFACE, THE EXPOSED PHOTOSENSITIVE LAYER IS DEVELOPED SO THAT A COPY OF THE CORRESPONDING ORIGINAL, PREFERABLY REDUCED IN SIZE, IS PRODUCED ON THE LAYER. THE ORIGINAL IS TRACED WITH A SENSING DEVICE, AND THE PATH TAKEN BY THE SENSING DEVICE OVER THE ORIGINAL IS USED FOR PRODUCING THE MOVEMENT OF AN EXPOSURE MARK TO DESCRIBE A PATH GEOMETRICALLY SIMILAR TO THAT OF THE SENSING DEVICE ON THE LIGHT-SENSITIVE LAYER.
Inventors
- 👤 Wolfgang Touchy
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 19:34
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70383; G03F7/704; H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; H10P76/2042
Claims Analysis
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References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-10-04 | 1975-04-05 | 1975-10-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-10-04 | 1979-04-05 | 1979-10-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-10-04 | 1983-04-05 | 1983-10-05 | $7700.00 | Window Closed / Lapsed |