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US3600292A Expired / Lapsed US ⏱️ 0.0 years remaining

Localized machining and deposition for microelectronic components by sputtering

Assignee: Westinghouse Electric Corp
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Filing: 1969-03-11
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Granted: 1971-08-17
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Expires: 1989-03-11
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Abstract

Abstract A SPUTTERING PROCESS IS DESCRIBED THAT IS SUITABLE FOR HIGHLY LOCALIZED DEPOSITION AND MACHINING OF ELEMENTS OF MICROELECTRONIC COMPONENTS EMPLOYING A STREAM OF GAS IN AN ATMOSPHERE AT LEAST WITHIN AN ORDER OF MAGNITUDE OF ATMOSPHERIC PRESSURE BETWEEN CLOSELY SPACED SPUTTERING ELECTRODES WHICH ARE PREFERABLY SUPPORTED BY THE COMPONENT SUBSTRATE. APPLICATIONS TO MICROELECTRONIC COMPONENTS SUCH AS FOR TUNING THE VIBRATORY MEMBERS OF RESONANT GATE TRANSISTORS ARE DESCRIBED.

Inventors

  • 👤 Harvey C Nathanson
  • 👤 John R Davis Jr

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 09:12
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35

Claims Analysis

Total Claims: 0
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References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1974-08-16 1975-02-15 1975-08-17 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1978-08-16 1979-02-15 1979-08-17 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1982-08-16 1983-02-15 1983-08-17 $7700.00 Window Closed / Lapsed

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