US3600292A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Localized machining and deposition for microelectronic components by sputtering
Assignee: Westinghouse Electric Corp
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Filing: 1969-03-11
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Granted: 1971-08-17
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Expires: 1989-03-11
Abstract
Abstract A SPUTTERING PROCESS IS DESCRIBED THAT IS SUITABLE FOR HIGHLY LOCALIZED DEPOSITION AND MACHINING OF ELEMENTS OF MICROELECTRONIC COMPONENTS EMPLOYING A STREAM OF GAS IN AN ATMOSPHERE AT LEAST WITHIN AN ORDER OF MAGNITUDE OF ATMOSPHERIC PRESSURE BETWEEN CLOSELY SPACED SPUTTERING ELECTRODES WHICH ARE PREFERABLY SUPPORTED BY THE COMPONENT SUBSTRATE. APPLICATIONS TO MICROELECTRONIC COMPONENTS SUCH AS FOR TUNING THE VIBRATORY MEMBERS OF RESONANT GATE TRANSISTORS ARE DESCRIBED.
Inventors
- 👤 Harvey C Nathanson
- 👤 John R Davis Jr
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 08:58
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-08-16 | 1975-02-15 | 1975-08-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-08-16 | 1979-02-15 | 1979-08-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-08-16 | 1983-02-15 | 1983-08-17 | $7700.00 | Window Closed / Lapsed |