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US3595775A Expired / Lapsed US ⏱️ 0.0 years remaining

Sputtering apparatus with sealed cathode-shield chamber

Assignee: RTX Corp
•
Filing: 1969-05-15
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Granted: 1971-07-27
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Expires: 1989-05-15
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Abstract

Abstract FILMS OF MATERIAL ARE DEPOSITED ON A SUBSTRATE AT HIGH RATES BY SPUTTERING IN WHICH A TARGET IS BOMBARDED BY IONS IN A LOW PRESSURE GLOW DISCHARGE IN THE PRESENCE OF A MAGNETIC FIELD. A VERY LOW PRESSURE IS PROVIDED BY A VACUUM PUMP IN A SEALED CHAMBER BETWEEN THE CATHODE AND THE GROUND SHIELD TO PREVENT ARCING AT HIGH POWER DENSITIES. ATMOSPHERIC PRESSURE MAY ALSO BE ADMITTED TO THE SEALED CHAMBER.

Inventors

  • 👤 Daniel H Grantham
  • 👤 Daniel J Quinn
  • 👤 Edouard L Paradis

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 11:53
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35; H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402

Claims Analysis

Total Claims: 0
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References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1974-07-26 1975-01-25 1975-07-27 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1978-07-26 1979-01-25 1979-07-27 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1982-07-26 1983-01-25 1983-07-27 $7700.00 Window Closed / Lapsed

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