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US3585089A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of making fast switching semiconductive devices with silicon nitride passivation

Assignee: Westinghouse Electric Corp
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Filing: 1969-06-24
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Granted: 1971-06-15
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Expires: 1989-06-24
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Abstract

Abstract SILICON NITRIDE PASSIVATION, PREFERABLY WITH A SUB-LAYER OF SILICON DIOXIDE, IS DISCLOSED FOR FAST SWITCHING (GOLD DOPED) SEMICONDUCTOR DEVICES IN A PROCESS WHEREIN NITRIDE DEPOSITION AND PATTERN FORMATION IS COMPLETED PRIOR TO GOLD DOPING SO THE NITRIDE LAYER IS OF GOOD QUALITY AND READILY ETCHED.

Inventors

  • 👤 John B Preece
  • 👤 Winand J Dautzenberg

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 21:37
CPC Classifications
H; H10; H10P; H10P95/00; H10W; H10W74/00; H10W74/40; Y; Y10; Y10S; Y10S148/00; Y10S148/114

Claims Analysis

Total Claims: 0
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References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1974-06-14 1974-12-14 1975-06-15 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1978-06-14 1978-12-14 1979-06-15 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1982-06-14 1982-12-14 1983-06-15 $7700.00 Window Closed / Lapsed

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