Ion implantation means including a variable ration ion source

Abstract

Abstract An ion source capable of producing an ion beam comprised of a plurality of controlled ion species. A plurality of effusion cells, each containing a particular evaporant, are positioned at equal distances from a hot ionizing surface. The number of molecules effusing from the respective effusion cells are controlled, thereby controlling the ratio of the molecules effusing from a particular cell with respect to the sum total of the molecules effusing from all the cells. The molecules, as they exit from each effusion cell, are directed to strike a hot ionizing surface where the neutral atoms are ionized. The ions are then extracted from the ion chamber to be deposited on some substrate.

Inventors

• 👤 Bryan H Hill

Bibliographic Details