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US3555282A Expired / Lapsed US ⏱️ 0.0 years remaining

Radiation sensitive switching system employing a semiconductor element

Assignee: NEC Corp
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Filing: 1968-07-30
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Granted: 1971-01-12
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Expires: 1988-07-30
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Abstract

Abstract A device is described for generating the beam effect in a semiconductor suitable therefor by applying a source of light at a portion of the semiconductor material to lower the resistance thereof and effectively raise the field intensity elsewhere in the semiconductor. The field intensity is produced by applying a voltage source across the semiconductor with a level selected to produce an electric field intensity in the material that is less than that necessary to produce Gunn oscillations but which is sufficiently high to permit the light source to trigger the semiconductor into high field domain Gunn oscillations.

Inventors

  • 👤 Hisayoshi Yanai
  • 👤 Toshiaki Ikoma
  • 👤 Takayuki Sugeta
  • 👤 Yasuo Matsukura
  • 👤 Kuniichi Ohta

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 19:39
CPC Classifications
H; H10; H10N; H10N80/00; H10N80/10; H10N80/103

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 127 words
A switching device comprising a semiconductor crystal capable of forming a high field domain resorting to the bulk effect negative resistance, an anode and a cathode in ohmic contact with said crystal, a load and an electric biasing source connected in series with said crystal for biasing said crystal to an electric field below the threshold value for forming said high field domain; and a source of light rays for irradiating a portion of said crystal to initiate formation of said high field domain for a time period shorter than the current pulse width t specific to said crystal, said t being given by the expression t L/v, where L is the length of said crystal, and v is the drift velocity of the high field domain.
Claim 2
Dependent Claim 127 words
A switching device comprising a semiconductor crystal capable of forming a high field domain resorting to the bulk effect negative resistance, an anode and a cathode in ohmic contact with said crystal, a load and an electric biasing source connected in series with said crystal for biasing said crystal to an electric field below the threshold value for forming said high field domain; and a source of light rays for irradiating a portion of said crystal to initiate formation of said high field domain for a time period shorter than the current pulse width t specific to said crystal, said t being given by the expression t L/v, where L is the length of said crystal, and v is the drift velocity of the high field domain.
Claim 3
Dependent Claim 31 words
The device as recited in claim 1, wherein said crystal contains n-type impurities of 1012 to 1016 atoms/cm3 and wherein said high field domain is formed resorting to the Gunn effect.
Claim 4
Dependent Claim 24 words
The device as recited in claim 1, wherein said light rays are caused to selectively radiate the portion of the crystal near said anode.
Claim 5
Dependent Claim 30 words
The device as recited in claim 1, wherein said crystal has high and low field portions and wherein said light rays are directed to irradiate said low electric field portion.
Claim 6
Dependent Claim 24 words
The device as recited in claim 4, wherein said light rays are caused to selectively radiate the portion of the crystal near said anode.

References Cited (Backward Citations)

US3439290A Cited
US3440425A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1974-01-11 1974-07-13 1975-01-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1978-01-11 1978-07-13 1979-01-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1982-01-11 1982-07-13 1983-01-12 $7700.00 Window Closed / Lapsed

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