Electron beam vaporization coating apparatus

Abstract

Abstract An apparatus for the vapor deposition of refractory substances on the surface of substrate materials is provided which includes a chamber adapted to be vacuumized, means rotatably disposed within said chamber adapted to support a source of refractory material, electron-gun means operatively disposed in cooperative association with said chamber adapted to impinge a beam of electrons upon said refractory materials and means adapted to convey a substrate material adjacent openings in masking means within said chamber substantially in alignment with said source of refractory material whereby electron bombardment of said refractory material causes evaporation thereof and deposition thereof on said substrate material and rotation of said source of refractory material permits a substantially uniform rate of evaporation thereof.

Inventors

• 👤 Ronald Frank Mcconnell

Bibliographic Details