Patent US3544401A successfully refreshed from Google Patents.
US3544401A
Expired / Lapsed
US
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High depth-to-width ratio etching process
Assignee: Texas Instruments Inc
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Filing: 1967-05-16
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Granted: 1970-12-01
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Expires: 1987-05-16
Abstract
No abstract record available.
Inventors
- 👤 Hall E Jarman
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 19:44
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/02; H; H10; H10F; H10F39/00; H10F39/10; H10F39/12; H10F39/191; H10F39/193; H10P; H10P50/00; H10P50/69; H10P50/691; H10P50/692; H10P50/693; H10P50/694; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/945
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
GB863065A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1973-11-30 | 1974-06-01 | 1974-12-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1977-11-30 | 1978-06-01 | 1978-12-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1981-11-30 | 1982-06-01 | 1982-12-01 | $7700.00 | Window Closed / Lapsed |