Patent US3405017A successfully refreshed from Google Patents.
US3405017A
Expired / Lapsed
US
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Use of organosilicon subbing layer in photoresist method for obtaining fine patterns for microcircuitry
Assignee: Raytheon Co
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Filing: 1965-02-26
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Granted: 1968-10-08
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Expires: 1985-02-26
Abstract
No abstract record available.
Inventors
- 👤 Gee Allen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 23:51
CPC Classifications
H; H10; H10P; H10P95/00; G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/11; H10W; H10W74/00; H10W74/40; H10W74/47
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1971-10-08 | 1972-04-08 | 1972-10-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1975-10-08 | 1976-04-08 | 1976-10-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1979-10-08 | 1980-04-08 | 1980-10-08 | $7700.00 | Window Closed / Lapsed |