Patent US3375110A successfully refreshed from Google Patents.
US3375110A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photo-masking system using p-xylylene polymers
Assignee: Union Carbide Corp
•
Filing: 1964-12-24
•
Granted: 1968-03-26
•
Expires: 1984-12-24
Abstract
No abstract record available.
Inventors
- 👤 William E Loeb
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 13:21
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; C; C08; C08G; C08G61/00; C08G61/02; C08G61/025; C08G2261/00; C08G2261/30; C08G2261/34; C08G2261/342; C08G2261/3424
Claims Analysis
Total Claims: 1
Claim 1
Independent Claim
24 words
METHOD FOR SELECTIVELY ETCHING SUBSTRATE SURFACES WHICH COMPRISES: (A) MAKING AN ETCHABLE SUBSTRATE COATED WITH A SUBSTANTIALLY UNSATURATED P-XYLYLENE POLYMER HAVING THE REPEATING UNIT:
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1971-03-26 | 1971-09-25 | 1972-03-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1975-03-26 | 1975-09-25 | 1976-03-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1979-03-26 | 1979-09-25 | 1980-03-26 | $7700.00 | Window Closed / Lapsed |