Patent US3322501A successfully refreshed from Google Patents.
← Back to Patent Explorer
US3322501A Expired / Lapsed US ⏱️ 0.0 years remaining

Preparation of gallium arsenide with controlled silicon concentrations

Assignee: International Business Machines Corp
•
Filing: 1964-07-24
•
Granted: 1967-05-30
•
Expires: 1984-07-24
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

No abstract record available.

Inventors

  • 👤 Jerry M Woodall

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 16:27
CPC Classifications
C; C01; C01G; C01G28/00; C30; C30B; C30B11/00; C30B29/00; C30B29/10; C30B29/40; C30B29/42; H; H10; H10P; H10P95/00; Y; Y10; Y10S; Y10S117/00; Y10S117/90; Y10S117/906

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 161 words
A METHOD FOR PRODUCING SINGLE CRYSTALS OF GALLIUM ARSENIDE HAVING REDUCED SILICON CONCENTRATION COMPRISING THE STEPS OF, HEATING GALLIUM IN A SILICA VESSEL WITHIN A CLOSED SYSTEM TO A TEMPERATURE ABOVE THE MELTING POINT OF GALLIUM ARSENIDE AT WHICH GALLIUM AND ARSENIC REACT TO PRODUCE GALLIUM ARSENIDE AND AT WHICH SILICA REACTS WITH GALLIUM TO GIVE GALLOUS OXIDE AND SILICON, SIMULTANEOUSLY HEATING ARSENIC WITHIN SAID CLOSED SYSTEM IN A TEMPERATURE RANGE NEAR THE SUBLIMATION TEMPERATURE OF ARSENIC (613* C.) TO VAPORIZE SAID ARSENIC, REACTING CARBON FROM A GRAPHITE BOAT WITH A QUANITY OF GALLIC OXIDE DISPOSED THEREIN A TEMPERATURE RANGE OF 900* TO 1250*C. TO PRODUCE CARBON MONOXIDE AND AN ATMOSPHERE OF GALLOUS OXIDE TO SUPPRESS THE FORMATION OF SILICON AND, VARYING THE PRESSURE OF SAID GALLOUS OXIDE ATMOSPHERE BY VARYING THE REACTION TEMPERATURE OF SAID CARBON AND SAID GALLIC OXIDE TO CONTROL THE AMOUNT OF SILICON IN SAID GALLIUM ARSENIDE CRYSTAL PRODUCED BY CONTROLLING THE REACTION BETWEEN GALLIUM AND SILICA.
Claim 2
Independent Claim 161 words
A METHOD FOR PRODUCING SINGLE CRYSTALS OF GALLIUM ARSENIDE HAVING REDUCED SILICON CONCENTRATION COMPRISING THE STEPS OF, HEATING GALLIUM IN A SILICA VESSEL WITHIN A CLOSED SYSTEM TO A TEMPERATURE ABOVE THE MELTING POINT OF GALLIUM ARSENIDE AT WHICH GALLIUM AND ARSENIC REACT TO PRODUCE GALLIUM ARSENIDE AND AT WHICH SILICA REACTS WITH GALLIUM TO GIVE GALLOUS OXIDE AND SILICON, SIMULTANEOUSLY HEATING ARSENIC WITHIN SAID CLOSED SYSTEM IN A TEMPERATURE RANGE NEAR THE SUBLIMATION TEMPERATURE OF ARSENIC (613* C.) TO VAPORIZE SAID ARSENIC, REACTING CARBON FROM A GRAPHITE BOAT WITH A QUANITY OF GALLIC OXIDE DISPOSED THEREIN A TEMPERATURE RANGE OF 900* TO 1250*C. TO PRODUCE CARBON MONOXIDE AND AN ATMOSPHERE OF GALLOUS OXIDE TO SUPPRESS THE FORMATION OF SILICON AND, VARYING THE PRESSURE OF SAID GALLOUS OXIDE ATMOSPHERE BY VARYING THE REACTION TEMPERATURE OF SAID CARBON AND SAID GALLIC OXIDE TO CONTROL THE AMOUNT OF SILICON IN SAID GALLIUM ARSENIDE CRYSTAL PRODUCED BY CONTROLLING THE REACTION BETWEEN GALLIUM AND SILICA.

References Cited (Backward Citations)

No citation records indexed.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1970-05-29 1970-11-28 1971-05-30 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1974-05-29 1974-11-28 1975-05-30 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1978-05-29 1978-11-28 1979-05-30 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag