Patent US3267015A successfully refreshed from Google Patents.
US3267015A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Systems and processes for coating by evaporation
Assignee: Alloyd Electronics Corp
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Filing: 1963-09-13
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Granted: 1966-08-16
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Expires: 1983-09-13
Abstract
No abstract record available.
Inventors
- 👤 John R Morley
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 15:30
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/24; C23C14/28; C23C14/30; H; H01; H01J; H01J37/00; H01J37/30; H01J37/305; H01J37/3053
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
191 words
AN ELECTRON BEAM EVAPORATING SYSTEM COMPRISING AND ELECTRON GUN INCLUDING A CATHODE FOR EMITTING ELECTRONS AND AN ANODE FOR ACCELERATING ELECTRONS IN ORDER TO GENERATE AN ELECTRON BEAM, A SOURCE MATERIAL HOLDER IN THE PATH OF SAID ELECTRON BEAM AT WHICH SUFFICIENT HEAT MAY BE GENERATED BY SAID ELECTRON BEAM TO VAPORIZE SAID SOURCE MATERIAL, AND A SUBSTRATE HOLDER FOR MOUNTING A SUBSTRATE TO RECEIVE EVAPORATED MATERIAL FROM SAID SOURCE MEANS FOR APPLYING A RELATIVELY LOW POTENTIAL TO SAID CATHODE AND SAID SUBSTRATE HOLDER, A GRID BETWEEN SAID SOURCE MATERIAL HOLDER AND SAID SUBSTRATE HOLDER, MEANS FOR APPLYING RELATIVELY HIGH POTENTIAL TO SAID GRID AND SAID SOURCE MATERIAL HOLDER, MEANS FOR APPLYING AN INTERMEDIATE POTENTIAL, BETWEEN SAID RELATIVELY LOW POTENTIAL AND SAID RELATIVELY HIGH POTENTIAL, TO SAID ANODE, THE DISTANCE FROM SAID SOURCE MATERIAL HOLDER TO SAID SUBSTRATE HOLDER RANGING FROM 10 TO 30 TIMES THE DISTANCE FROM SAID SOURCE MATERIAL HOLDER TO SAID GRID, SAID RELATIVELY LOW POTENTIAL OF SAID SUBSTRATE HOLDER ESTABLISHING A FIELD REPELLING REFLECTED ELECTRONS AND SECONDARY ELECTRONS EMANATING FROM SAID SOURCE MATERIAL HOLDER AND SAID GRID ESTABLISHING A FIELD REFLECTING IONS EMANATING FROM SAID SOURCE MATE-
Claim 2
Dependent Claim
191 words
AN ELECTRON BEAM EVAPORATING SYSTEM COMPRISING AND ELECTRON GUN INCLUDING A CATHODE FOR EMITTING ELECTRONS AND AN ANODE FOR ACCELERATING ELECTRONS IN ORDER TO GENERATE AN ELECTRON BEAM, A SOURCE MATERIAL HOLDER IN THE PATH OF SAID ELECTRON BEAM AT WHICH SUFFICIENT HEAT MAY BE GENERATED BY SAID ELECTRON BEAM TO VAPORIZE SAID SOURCE MATERIAL, AND A SUBSTRATE HOLDER FOR MOUNTING A SUBSTRATE TO RECEIVE EVAPORATED MATERIAL FROM SAID SOURCE MEANS FOR APPLYING A RELATIVELY LOW POTENTIAL TO SAID CATHODE AND SAID SUBSTRATE HOLDER, A GRID BETWEEN SAID SOURCE MATERIAL HOLDER AND SAID SUBSTRATE HOLDER, MEANS FOR APPLYING RELATIVELY HIGH POTENTIAL TO SAID GRID AND SAID SOURCE MATERIAL HOLDER, MEANS FOR APPLYING AN INTERMEDIATE POTENTIAL, BETWEEN SAID RELATIVELY LOW POTENTIAL AND SAID RELATIVELY HIGH POTENTIAL, TO SAID ANODE, THE DISTANCE FROM SAID SOURCE MATERIAL HOLDER TO SAID SUBSTRATE HOLDER RANGING FROM 10 TO 30 TIMES THE DISTANCE FROM SAID SOURCE MATERIAL HOLDER TO SAID GRID, SAID RELATIVELY LOW POTENTIAL OF SAID SUBSTRATE HOLDER ESTABLISHING A FIELD REPELLING REFLECTED ELECTRONS AND SECONDARY ELECTRONS EMANATING FROM SAID SOURCE MATERIAL HOLDER AND SAID GRID ESTABLISHING A FIELD REFLECTING IONS EMANATING FROM SAID SOURCE MATE-
Claim 3
Dependent Claim
153 words
A PROCESS FOR PRODUCING A BRILLINATLY REFLCTING METALLIC COAT ON A SUBSTRATE, SAID PROCESS COMPRISING THE STEPS OF DIRECTING AN ELECTRON BEAM AT A SOURCE MATERIAL IN ORDER TO HEAT SAID SOURCE MATERIAL TO A TEMPERATURE ABOVE WHICH IT VAPORIZES, DIRECTING VAPORIZED SOURCE MATERIAL FROM SAID SUORCE MATERIAL TO A SUBSTRATE, MAINTAINING SAID SUBSTRATE AT A LOW NEGATIVE POTENTIAL IN ORDER TO REPEL REFLECTED ELECTRONS AND SECONDARY ELECTRONS EMITTED FROM SAID SOURCE MATERIAL, AND INTERPOSING BETWEEN SAID SUBSTRATE AND SAID SOURCE MATERIAL A POSITIVE FIELD IN ORDER TO REPEAL POSITIVELY CHARGED IONS EMITTED FROM SAID SOURCE MATERIAL, THE MAGNITUDES OF SAID FIELDS BEING SUCH THAT SAID ELECTRON BEAM IS CAPABLE OF PENETRATING SAID POSITIVELY CHARGED FIELD, THE DISTANCE BETWEEN SAID SOURCE AND SAID SUBSTRATE RANGING FROM 10 TO 30 TIMES THE DISTANCE BETWEEN SAID SOURCE AND THE POINT OF SAID INTERPOSING WHEREBY ONLY NEUTRAL VAPORIZED PARTICLES FROM SAID SOURCE MATERIAL REACH SAID SUBSTRATE.
Claim 4
Dependent Claim
153 words
A PROCESS FOR PRODUCING A BRILLINATLY REFLCTING METALLIC COAT ON A SUBSTRATE, SAID PROCESS COMPRISING THE STEPS OF DIRECTING AN ELECTRON BEAM AT A SOURCE MATERIAL IN ORDER TO HEAT SAID SOURCE MATERIAL TO A TEMPERATURE ABOVE WHICH IT VAPORIZES, DIRECTING VAPORIZED SOURCE MATERIAL FROM SAID SUORCE MATERIAL TO A SUBSTRATE, MAINTAINING SAID SUBSTRATE AT A LOW NEGATIVE POTENTIAL IN ORDER TO REPEL REFLECTED ELECTRONS AND SECONDARY ELECTRONS EMITTED FROM SAID SOURCE MATERIAL, AND INTERPOSING BETWEEN SAID SUBSTRATE AND SAID SOURCE MATERIAL A POSITIVE FIELD IN ORDER TO REPEAL POSITIVELY CHARGED IONS EMITTED FROM SAID SOURCE MATERIAL, THE MAGNITUDES OF SAID FIELDS BEING SUCH THAT SAID ELECTRON BEAM IS CAPABLE OF PENETRATING SAID POSITIVELY CHARGED FIELD, THE DISTANCE BETWEEN SAID SOURCE AND SAID SUBSTRATE RANGING FROM 10 TO 30 TIMES THE DISTANCE BETWEEN SAID SOURCE AND THE POINT OF SAID INTERPOSING WHEREBY ONLY NEUTRAL VAPORIZED PARTICLES FROM SAID SOURCE MATERIAL REACH SAID SUBSTRATE.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1969-08-15 | 1970-02-14 | 1970-08-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1973-08-15 | 1974-02-14 | 1974-08-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1977-08-15 | 1978-02-14 | 1978-08-16 | $7700.00 | Window Closed / Lapsed |