← Back to Patent Explorer
US3267014A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for rapidly etching a flatbottomed pit in a germanium wafer

Assignee: Lanteris Space LLC
•
Filing: 1963-07-11
•
Granted: 1966-08-16
•
Expires: 1983-07-11
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

No abstract record available.

Inventors

  • 👤 Donald P Sanders

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 19:08
CPC Classifications
C; C25; C25F; C25F3/00; C25F3/02; C25F3/12; H; H10; H10P; H10P50/00; H10P50/60; H10P50/61; H10P50/613

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 110 words
A PROCESS FOR RAPIDLY ETCHING A FLAT-BOTTOMED PIT IN THE FACE OF A GERMANIUM WAFER COMPRISING: DIRECTING AGAINST SAID WAFER FROM A NOZZLE SPACED THEREFROM A JET OF AN ELECTROLYTE SOLUTION CONSISTING ESSENTIALLY OF ABOUT 1730 TO 1762 PARTS H2O, ABOUT 9 TO 52 PARTS H2SO4, AND ABOUT 46 TO 57 PARTS HF, APPLYING AN ETCHING VOLTAGE ACROSS SAID SOLUTION AND SAID WAFER SUFFICIENT TO CREATE A CURRENT DENSITY OF AT LEAST ABOUT 5X10-4 AMPERES PER SQUARE INCH IN SAID JET, ILLUMINATING THE FACE OF SAID WAFER BEING ETCHED, AND SPACING SAID NOZZLE FROM SAID WAFER A DISTANCE INTERMEDIATE THE RESPECTIVE DISTANCES WHICH WILL PROVIDE BOWL-BOTTOMED AND MOUND-BOTTOMED ETCH PITS.
Claim 2
Dependent Claim 110 words
A PROCESS FOR RAPIDLY ETCHING A FLAT-BOTTOMED PIT IN THE FACE OF A GERMANIUM WAFER COMPRISING: DIRECTING AGAINST SAID WAFER FROM A NOZZLE SPACED THEREFROM A JET OF AN ELECTROLYTE SOLUTION CONSISTING ESSENTIALLY OF ABOUT 1730 TO 1762 PARTS H2O, ABOUT 9 TO 52 PARTS H2SO4, AND ABOUT 46 TO 57 PARTS HF, APPLYING AN ETCHING VOLTAGE ACROSS SAID SOLUTION AND SAID WAFER SUFFICIENT TO CREATE A CURRENT DENSITY OF AT LEAST ABOUT 5X10-4 AMPERES PER SQUARE INCH IN SAID JET, ILLUMINATING THE FACE OF SAID WAFER BEING ETCHED, AND SPACING SAID NOZZLE FROM SAID WAFER A DISTANCE INTERMEDIATE THE RESPECTIVE DISTANCES WHICH WILL PROVIDE BOWL-BOTTOMED AND MOUND-BOTTOMED ETCH PITS.

References Cited (Backward Citations)

US2844531A Cited
US2850444A Cited
US2854387A Cited
US2998362A Cited
US3188284A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1969-08-15 1970-02-14 1970-08-16 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1973-08-15 1974-02-14 1974-08-16 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1977-08-15 1978-02-14 1978-08-16 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag