Sequential registration scheme

Claim 1

IN THE MASS FABRICATION OF SEMICONDUCTOR DEVICES USING A MULTISTEP PHOTOMECHANICAL REPRODUCTION PROCESS, THE STEPS WHICH COMPRISE: PROVIDING A MASK CONTAINING A MULTIPLICITY OF SPACED ARRAYS OF ELEMENT-PRODUCING AREAS EACH OF WHICH ARRAYS COMPRISES A SET OF SPACED IMAGES HAVING SPACING IDENTICAL TO THE CORRESPONDING SPACING IN EACH ARRAY AND REPRESENTATIVE OF ELEMENTS NECESSARY TO THE PRODUCTION OF AN INDIVIDUAL SEMICONDUCTOR DEVICE; UTILIZING SAID MASK PHOTOGRAPHICALLY TO GENERATE, ON A LIGHT-SENSITIZED SURFACE OF A BODY OF SEMICONDUCTIVE MATERIAL, A PATTERN OF FIRST IMAGES OF AN IDENTICAL ONE OF SAID ELEMENTS FROM EACH OF SAID SETS; THEREAFTER POSITIONING SAID MASK SO AS TO ALIGN A SECOND ONE OF SAID IMAGES OF EACH SET WITH A REPRESENTATION OF THE IMAGE PREVIOUSLY PRODUCED FROM THAT SET WHEREBY SIMULTANEOUSLY AND AUTOMATICALLY FO EFFECT REGISTRATION OF THE SECOND IMAGE OF EACH OF SAID SETS WITH THE CORRESPONDING FIRST IMAGE REPRESENTATION OF THAT SET, AND GENERATING BY USE OF SAID MASK A PATTERN OF SAID SECOND IMAGES OF SAID SETS.