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US3170859A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for the preparation of silicon films

Assignee: Merck and Co Inc
•
Filing: 1959-03-25
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Granted: 1965-02-23
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Expires: 1979-03-25
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Abstract

No abstract record available.

Inventors

  • 👤 Boudart Michel
  • 👤 Peter I Pollak

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 23:51
CPC Classifications
C; C30; C30B; C30B29/00; C30B29/02; C30B29/06; C01; C01B; C01B33/00; C01B33/02; C23; C23C; C23C16/00; C23C16/22; C23C16/24; C30B25/00; C30B25/02

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 100 words
THE METHOD OF FORMING A FILM OF HIGH PURITY SILICON ON A SUBSTRATE WHICH COMPRISES FLOWING HYDROGEN INTO A REACTION CHAMBER, PROVIDING A MASS OF SILICON AND A SUBSTRATE IN SAID CHAMBER WITH SAID SUBSTRATE DOWNSTREAM OF SAID MASS OF SILICON IN SAID HYDROGEN FLOW, EXPOSING SAID HYDROGEN TO A SOURCE OF ENERGY SUFFICIENT TOO DISASSOCIATE HYDROGEN GAS TO HYDROGEN ATOMS AT A POINT IN SAID CHAMBER WHERE SAID HYDROGEN ATOMS THUS GENERATED CONTACTAND REACT WITH SAID MASS OF SILICON TO FORM A SILICON HY DRIDE COMPLEX, AND EFFECTING DEPOSITION OF SILICON FROM SAID SILICON HYDRIDE COMPLEXES ON SAID SUBSTRATE.
Claim 2
Independent Claim 100 words
THE METHOD OF FORMING A FILM OF HIGH PURITY SILICON ON A SUBSTRATE WHICH COMPRISES FLOWING HYDROGEN INTO A REACTION CHAMBER, PROVIDING A MASS OF SILICON AND A SUBSTRATE IN SAID CHAMBER WITH SAID SUBSTRATE DOWNSTREAM OF SAID MASS OF SILICON IN SAID HYDROGEN FLOW, EXPOSING SAID HYDROGEN TO A SOURCE OF ENERGY SUFFICIENT TOO DISASSOCIATE HYDROGEN GAS TO HYDROGEN ATOMS AT A POINT IN SAID CHAMBER WHERE SAID HYDROGEN ATOMS THUS GENERATED CONTACTAND REACT WITH SAID MASS OF SILICON TO FORM A SILICON HY DRIDE COMPLEX, AND EFFECTING DEPOSITION OF SILICON FROM SAID SILICON HYDRIDE COMPLEXES ON SAID SUBSTRATE.

References Cited (Backward Citations)

US1489724A Cited
AU1943229A Cited
GB583142A Cited
US2768061A Cited
US2945797A Cited
US2955966A Cited
US3008897A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1968-02-23 1968-08-24 1969-02-23 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1972-02-23 1972-08-24 1973-02-23 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1976-02-23 1976-08-24 1977-02-23 $7700.00 Window Closed / Lapsed

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