Method for the deposition of thin films by electron deposition

Claim 1

A METHOD OF PROGRESSIVELY GROWING A THIN FILM OF POLYMERIZED MATERIAL OF 1000 ANGSTROMS OF LESS IN THICKNESS, IN A PREDETERMINED PATTERN ON A SUBSTRATE AT AMBIENT TEMPERATURES, COMPRISING THE STEPS OF : PROVIDING A LOW ORDER VACUUM ATMOSPHERE CONTAINING VAPOR MOLECULES OF SAID ATMOSPHERE SUCH THAT MOLECULES OF THE VAPOR ARE PROGRESSIVELY ADSORBED ONTO THE SUBSTRATE, DIRECTING A LOW CURRENT INTENSITY BEAM OF ELECTRONS AGAINST THE SUBSTRATE IN THE DESIRED PATTERN TO POLYMERIZE THE ADSORBED MOLECULES AT THOSE POSITIONS OF THE SUBSTRATE RECEIVING THE BEAM, THE RELATIONSHIP OF THE ORDER OF VACUUM MAINTAINED AND THE LOW CURRENT DENSITY OF THE BEAM BEING SUCH AS TO PROVIDE RELATIVELY FEW COLLISIONS OF ELECTRONS WITH MOLECULES IN THE VAPOR WHEREBY THE POLYMERIZATION OF THE MATERIAL TO FORM THE THIN FILM OCCURS PREDOMINANTLY ON THE SUBSTRATE AND AT THOSE DISCRETE POSITIONS RECEIVING THE ELECTROM BEAM, AND MAINTAINING THE ELECTRICAL POTENTIAL OF THE SUBSTRATE IN CONDITION TO RECEIVE THE ELECTRONS FROM THE BEAM.