Process for producing a fine mesh pattern on a substrate

Claim 1

THE PROCESS OF APPLYING A POSITIVE IMAGE OF A MESH MASK CONTAINING AN ELEMENT SELECTED FROM THE MAGNETICALLY ATTRACTED GROUP OF IRON, NICKEL, COBALT, MANGANESE, CHROMIUM AND CERIUM HAVING INTERSTICES TO A SUBSTRATE WHICH IS ACCOMPLISHED BY CONTACTING A FIRST SIDE OF THE SUBSTRATE WITH THE MESH MASK WHICH IS ATTRACTED BY A MAGNETIC FIELD, APPLYING A MAGNETIC FIELD TO THE MESH MASK AS A MEANS FOR MAINTAINING THE MESH MASK AGAINST THE FIRST SIDE OF THE SUBSTRATE, APPLYING A POWDER SELECTED FROM THE GROUP OF IRON AND NICKEL ATTRACTED BY A MAGNETIC FIELD THROUGH THE INTERSTICES IN THE MESH MASK TO THE FIRST SIDE OF THE SUBSTRATE SELECTED FROM THE GROUP OF GLASS, MICA, PLASTIC AND PAPER, AND IN A PATTERN DETERMINED BY THE INTERSTICES IN THE MAGNETICALLY ATTRACTED MESH MASK, REMOVING THE MESH MASK FROM THE FIRST SIDE OF THE SUBSTRATE BY LIFTING THE MESH MASK IN A NORMAL DIRECTION FROM THE POWDER BEARING SIDE OF THE SUBSTRATE ALONG WITH A MINIMUM OF POWDER PARTICLES THAT ARE ATTRACTED THEREBY WITH A MINIMUM OF DISTORTION OF THE POWDER APERTURE DEFINED PATTERN RETAINED ON THE SURFACE OF THE SUBSTRATE BY THE ATTRACTION OF THE MAGNETIC FIELD, CAUSING A VAPORIZED MATERIAL TO ADHERE TO THE FIRST SIDE OF THE SUBSTRATE AND TO CONTINUOUSLY OVERLIE THE POWDER PATTERN RETAINED THEREON BY THE ATTRACTION OF THE MAGNETIC FIELD, AND REVERSING THE POLARITY OF THE MAGNETIC FIELD IN APPLYING A REPULSION FORCE CAPABLE OF REMOVING THE POWDER FROM THE FIRST SIDE OF THE SUBSTRATE LEAVING THE ADHERED MATERIAL BONDED TO THE SUBSTRATE IN A PATTERN WHICH IS A POSITIVE IMAGE OF THE MESH MASK.