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US2837448A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of fabricating semiconductor pn junctions

Assignee: AT&T Inc
•
Filing: 1953-10-26
•
Granted: 1958-06-03
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Expires: 1973-10-26
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Abstract

No abstract record available.

Inventors

  • 👤 Carl D Thurmond

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 07:31
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/80; H10D62/83; H10D62/834; C; C30; C30B; C30B31/00; C30B31/04; H10D1/00; H10D1/40; H10D48/00; H10D48/30; H10D48/38; H10P; H10P32/00; H10P32/10; H10P32/16; H10P95/00; H10P95/50; Y; Y10; Y10S; Y10S252/00; Y10S252/95

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 142 words
THE METHOD OF PRODUCING A SEMICONDUCTOR PN JUNCTION WHICH COMPRISES PLACING A SIGNIFICANT IMPURITY DETERMINATIVE OF ONE CONDUCTIVELY TYPE UPON CRYSTALLINE SEMICONDUCTIVE MATERIAL OF OPPOSITIE CONDUCTIVELY TYPE, HEATING THE ASSEMBLY TO A TEMPERATURE ABOVE THE EUTECTIC TERMPERATURE OF SAID IMPURITY AND MATERIAL AND BELOW THE MELTING POINT OF SAID MATERIAL, SLOWLY COOLING THE ASSEMBLY TO A TEMPERATURE BETWEEN THE INITIAL TEMPERATURE AND SAID EUTECTIC TEMPERATURE FOR FORMING A LAYER OF THE ONE CONDUCTIVITY TYPE ON THE SURFACE OF THE SEMICONDUCTIVE BODY IN CONTACT WITH THE MOLTEN LAYER, FLOODING THE RESULTING COMBINATION WITH A MOLTEN METAL WHICH IS APPRECIABLY SOFTER THAN AND WHICH HAS A MELTING POINT SUBSTANTIALLY BELOW THAT OF SAID IMPRUITY AND FURTHER CHARACTERIZED IN THAT SAID SEMI-CONDUCTIVE MATERIAL AND SAID IMPURITY ARE ONLY SLIGHTLT SOLUBLE IN SAID MOLTEN METAL AT ITS MELTING POINT, AND COOLING THE PRODUCT TO ROOM TEMPERATURE.
Claim 2
Independent Claim 142 words
THE METHOD OF PRODUCING A SEMICONDUCTOR PN JUNCTION WHICH COMPRISES PLACING A SIGNIFICANT IMPURITY DETERMINATIVE OF ONE CONDUCTIVELY TYPE UPON CRYSTALLINE SEMICONDUCTIVE MATERIAL OF OPPOSITIE CONDUCTIVELY TYPE, HEATING THE ASSEMBLY TO A TEMPERATURE ABOVE THE EUTECTIC TERMPERATURE OF SAID IMPURITY AND MATERIAL AND BELOW THE MELTING POINT OF SAID MATERIAL, SLOWLY COOLING THE ASSEMBLY TO A TEMPERATURE BETWEEN THE INITIAL TEMPERATURE AND SAID EUTECTIC TEMPERATURE FOR FORMING A LAYER OF THE ONE CONDUCTIVITY TYPE ON THE SURFACE OF THE SEMICONDUCTIVE BODY IN CONTACT WITH THE MOLTEN LAYER, FLOODING THE RESULTING COMBINATION WITH A MOLTEN METAL WHICH IS APPRECIABLY SOFTER THAN AND WHICH HAS A MELTING POINT SUBSTANTIALLY BELOW THAT OF SAID IMPRUITY AND FURTHER CHARACTERIZED IN THAT SAID SEMI-CONDUCTIVE MATERIAL AND SAID IMPURITY ARE ONLY SLIGHTLT SOLUBLE IN SAID MOLTEN METAL AT ITS MELTING POINT, AND COOLING THE PRODUCT TO ROOM TEMPERATURE.

References Cited (Backward Citations)

US2402662A Cited
US2569347A Cited
US2561411A Cited
US2603693A Cited
US2644852A Cited
US2725316A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1961-06-02 1961-12-02 1962-06-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1965-06-02 1965-12-02 1966-06-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1969-06-02 1969-12-02 1970-06-03 $7700.00 Window Closed / Lapsed

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