Patent US2748031A successfully refreshed from Google Patents.
US2748031A
Expired / Lapsed
US
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Reproduction of printed patterns by vacuum evaporation
Assignee: Individual
•
Filing: 1952-12-31
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Granted: 1956-05-29
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Expires: 1972-12-31
Abstract
No abstract record available.
Inventors
- 👤 Kafig Emanuel
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 04:06
CPC Classifications
C; C03; C03C; C03C17/00; C03C17/34; C03C17/36; C03C17/3602; C03C17/3613; C03C17/3655; C03C17/3657; C23; C23C; C23C14/00; C23C14/04; C23C14/042; H; H05; H05K; H05K3/00; H05K3/02; H05K3/04; H05K3/046; H05K3/048; H10; H10N; H10N97/00; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/49117; Y10T29/49124; Y10T29/49155; Y10T29/49156; Y10T428/00; Y10T428/24; Y10T428/24802; Y10T428/24851; Y10T428/24917
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
129 words
THE PROCESS OF PRODUCING A PATTERN OF METALLIC AREAS UPON A SUPPORTING BASE MATERIAL, COMPRISING THE STEPS OF APPLYING A LAYER OF A SOLUBLE SUBSTANCE HAVING A CONFIGURATION WHICH IS THE NEGATIVE OF THE DESIRED PATTERN, DEPOSITING BY VAPOR DEPOSITION OF A LAYER OF SILICON MONOXIDE ON THE SURFACE OF THE BASE MATERIAL, RETAINING IN VACUO SAID SUPPORTING BASE MATERIAL HAVING THEREON SAID AFOREMENTIONED LAYER OF SILICON MONOXIDE TO PREVENT OXIDATION OF SAID SILICON MONOXIDE, DEPOSITING BY VAPOR DEPOSITION UPON THE SECOND MENTIONED LAYER OF AN OVERALL LAYER OF THE DESIRED METAL, COVERING THE ENTIRE LAYERED AREA WITH A SECOND LAYER OF SILICON MONOXIDE, AND REMOVING THE LAYER OF SOLUBLE SUBSTANCE AND THOSE PORTIONS OF METAL OVERLYING SAID SOLUBLE SUBSTANCE BY THE ACTION OF A LIQUID SOLVENT APPLIED THERETO.
Claim 2
Dependent Claim
129 words
THE PROCESS OF PRODUCING A PATTERN OF METALLIC AREAS UPON A SUPPORTING BASE MATERIAL, COMPRISING THE STEPS OF APPLYING A LAYER OF A SOLUBLE SUBSTANCE HAVING A CONFIGURATION WHICH IS THE NEGATIVE OF THE DESIRED PATTERN, DEPOSITING BY VAPOR DEPOSITION OF A LAYER OF SILICON MONOXIDE ON THE SURFACE OF THE BASE MATERIAL, RETAINING IN VACUO SAID SUPPORTING BASE MATERIAL HAVING THEREON SAID AFOREMENTIONED LAYER OF SILICON MONOXIDE TO PREVENT OXIDATION OF SAID SILICON MONOXIDE, DEPOSITING BY VAPOR DEPOSITION UPON THE SECOND MENTIONED LAYER OF AN OVERALL LAYER OF THE DESIRED METAL, COVERING THE ENTIRE LAYERED AREA WITH A SECOND LAYER OF SILICON MONOXIDE, AND REMOVING THE LAYER OF SOLUBLE SUBSTANCE AND THOSE PORTIONS OF METAL OVERLYING SAID SOLUBLE SUBSTANCE BY THE ACTION OF A LIQUID SOLVENT APPLIED THERETO.
References Cited (Backward Citations)
US2139640A
Cited
US2107784A
Cited
US2304182A
Cited
US2447836A
Cited
US2373639A
Cited
US2441960A
Cited
US2386876A
Cited
US2456899A
Cited
US2628921A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1959-05-29 | 1959-11-28 | 1960-05-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1963-05-29 | 1963-11-28 | 1964-05-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1967-05-29 | 1967-11-28 | 1968-05-29 | $7700.00 | Window Closed / Lapsed |