Iio hsvm

Claim 1

A PROCESS FOR THE RESOLUTION OF A MIXTURE OF ORGANIC COMPOUNDS ONLY A PORTION OF WHICH REACTS WITH AN AMIDE SELECTED FROM THE GROUP CONSISTING OF UREA AND THIOUREA TO FORM SOLID ADDUCTS THEREWITH, WHICH COMPRISES, CONTACTING SAID MIXTURE WITH A CONCENTRATED SOLUTION OF SAID AMIDE UNDER ADDUCT-FORMING CONDITIONS COMPRISING A REACTION TEMPERATURE IN THE RANGE 60 TO 80* F. AND A TIME OF 1 TO 60 MINUTES SO AS TO FORM A MIXTURE COMPRISING A SOLID ADDUCT PHASE, A RESIDUAL PHAE OF UNREACTED ORGANIC COMPOUNDS AND A DEPLETED AMIDE SOLUTION PHASE; MAINTAINING THE CONSISTENCY OF THE MIXTURE WITHIN THE REACTOR AS A SLURRY BY ADDITION THERETO OF EXCESS AMIDE SOLUTION; PASSING SAID SLURRY TO A FIRST SEPARATING ZONE AND RETAINING SOLID ADDUCT PARTICLES THEREIN; PASSING THE LIQUID EFFLUENT FROM SAID FIRST SEPARATING ZONE TO A SECOND SEPARATING ZONE AND SEPARATING UNCREACTED ORGANIC COMPOUNDS FROM DEPLETED AMIDE SOLUTION; WASHING SOLID ADDUCT PARTICLES IN SAID FIRST SEPARATING ZONE FREE FROM OCCLUDED IMPURITIES BY CONTACTING SAME WITH A WASHING MEDIUM NONREACTIVE WITH SAID SELECTED AMIDE AND A NONSOLVENT THEREFOR AT A TEMPERATURE BELOW THE DECOMPOSITION TEMPERATURE OF SAID ADDUCT; DECOMPOSING THE PURIFIED ADDUCT IN SAID FIRST SEPARATING ZONE BY CONTACTING SAME WITH A QUANTITY OF SAID WASHING MEDIUM AT AN ELEVATED TEMPERATURE ABOVE THE DECOMPOSITION TEMPARATURE OF SAID ADDUCT; RECOVERING FROM SIAD DECOMPOSITION STEP REGENERATED ADDUCT-FORMING COMPOUND IN ADMIXTURE WITH WASHING MEDIUM WHILE RETAINING SOLID REGENERATED AMIDE WITHIN SAID FIRST SEPARATING ZONE; RECOVERING REGENERATED ADDUCT-FORMING COMPOUND FROM SAID ADMIXTURE; HEATING DEPLETED AMIDE SOLUTION TO AS TEMPERATURE ABOVE THE REACTION TEMPERATURE; REMOVING SOLID AMIDE FROM SAID FIRST SEPARATING ZONE BY CONTACTING SAME WITH HEATED DEPLETED AMIDE SOLUTION FROM SAID SECOND SEPARATING ZONE AT SAID ELEVATED TEMPERATURE SO AS TO DISSOLVE ALL SAID SOLID AMIDE; AND RECYCLING SAID RECONCENTRATED AMIDE SOLUTION TO SAID FIRST CONTACTING STEP.