Liquid and gas feeding

Claim 1

IN FLUID FEEDING APPARATUS, IN COMBINATION: VACUUM-TYPE GAS FEEDING APPARATUS WHICH COMPRISES LIQUID-CONTAINING MEANS FOR RECEIVING GAS, SAID LIQUID-CONTAINNG MEANS COMPRISING AN ENCLOSED PASSAGE THROUGH WHICH THE SAID CONTAINED LIQUID FLOWS, FILLING THE PASSAGE, AND GAS RECEIVING MEANS FOR INJECTING GAS INTO SAID PASSAGE, SAID GAS FEEDING APPARATUS ALSO COMPRISING MEANS FOR FEEDING A CONTINUOUS FLOW OF GAS TO SAID LIQUIDCONTAINING MEANS UNDER A CONTINUOUSLY MAINTAINED PRESSURE DROP TO A VACUUM AND AT A RATE GOVERNED SOLELY BY THE VALUE OF SAID VACUUM, AND VACUUM CONTROL MEANS FOR CONTROLLING THE VACUUM AT A SELECTED VALUE TO MAINTAIN A DESIRED RATE OF GAS FEED;A LIQUID SUPPLY VESSEL HAVING AN OUTLET AND MEANS FOR MAINTAINING A PREDETERMINED HEAD IN THE LIQUID AT SAID OUTLET, SAID LAST-MENTIONED MEANS COMPRISING MEANS FOR MAINTAINING THE VESSEL FILLED WITH LIQUID TO A PREDETERMINED LEVEL ABOVE SAID OUTLET AND SAID OUTLET BEING DISPOSED AND WHOLLY SUBMERGED BELOW SAID PREDETERMINED LEVEL, A LIQUID-RECEIVING VACUUM CHAMBER HAVING A CONNECTION TO RECEIVE LIQUID FROM SAID OUTLET, SAID VACUUM CHAMBER HAVING MEANS TO MAINTAIN A PREDETERMINED LIQUID LEVEL THEREIN AND SAID CONNECTION FROM THE AFORESAID OUTLET BEING DISPOSED TO OPEN IN SAID CHAMBER AT A LOCALITY WHOLLY BELOW THE LEVEL OF LIQUID IN THE CHAMBER, FLOW RESISTANCE MEANS IN SAID CONNECTION BETWEEN THE VESSEL AND THE CHAMBER SO THAT LIQUID WILL FLOW CONTINUOUSLY FORM THE VESSEL TO THE CHAMBER AT A RATE GOVERNED SOLELY BY THE AMOUNT BY WHICH PRESSURE DOWNSTREAM OF SAID FLOW RESISTANCE MEANS DEPARTS FROM SAID PREDETERMINED HEAD, AND MEANS CONNECTING SAID CHAMBER WITH THE GAS FEEDING APPARATUS, FOR DIRECTING LIQUID CONTINUOUSLY FROM THE CHAMBER, UNDER SUCTION OF THE VACUUM THEREIN, TO THE LIQUID-CONTAINING MEANS AND FOR CONTROL OF THE VACUUM IN THE CHAMBER BY THE AFORESAID VACUUM CONTROL MEANS, SAID LASTMENTIONED MEANS INCLUDING CONDUIT STRUCTURE PROVIDING FLUID COMMUNICATION BETWEEN THE CHAMBER AND THE VACUUM CONTROL MEANS, TO MAINTAIN THE PRESSURE OF THE LIQUID IN THE CHAMBER CONTINUOUSLY AT A VALUE SELECTED BY THE VACUUM CONTROL MEANS AND CORRESPONDING TO THE AFORESAID SELECTED VALUE OF VACUUM.