Method for the measurement of aberration of optical projection system, a mask and a exposure device for optical project system

Abstract

Abstract A sort of method for measurement of aberration of optical projection system, by means of a mask and a exposure device for optical project system, including: disposing the lineas having the same width and the mask of spaced patterns in the optical path of the projection optical system, disposing the substrate with photoresist agent in the projection spot of the projection optical system, projecting of said lines and the spaced patterns on the photoresist layer on sayd substrate by means of the projection optical system and in predetermined exposure volume, for exposure, developing the exposed substrate, and forming the lines and the spaced patterns formed in the development process and on the photoresist layer on the substrate , for obtaining the image aberration by means of the difference in width of the widths of the pattern lines formed on both ends in the space of the patterned image.

Inventors

• 👤 Koji Kaise
• 👤 Toshio Tsukagoshi
• 👤 Tsunehito Hayashi

Bibliographic Details