Plasma treatment system

Abstract

Abstract PURPOSE:To miniaturize a vacuum vessel without deteriorating plasma treatment characteristics by introducing a reaction gas into an electron cyclotron resonance (ECR) plane formed at approximately a right angle to the direction of propagation of microwaves and shaping the state in which the concentration of the reaction gas in the ECR plane is increased. CONSTITUTION:A microwave introducing window 10 is shaped at a position where the AC field strength of introducing microwaves 3 is brought to approximately zero, an ECR is positioned at the position of (1/4+n)lambda(n=0, 1, 2...) from the microwave introducing window 10 and an article to be treated is positioned at the position of (1/2+n)lambda in each relationship of the location of the microwave introducing window 10, the location of the ECR and the location of the article to be treated 11. A reaction gas is flowed in approximately parallel with an ECR plane and the concentration of the reaction gas on the ECR plane is increased, and the high absorption band of microwaves 3 is shaped. Accordingly, the transmittance of microwaves 3 to the article to be treated 11 is reduced remarkably, and distances between the microwave introducing window 10 and the article to be treated 11 and between the article to be treated 11 and the position of the ECR can be shortened, thus miniaturizing a vacuum vessel 1 in the axial direction, i.e., the direction of propagation of microwaves.

Inventors

• 👤 Takuya Fukuda
• 👤 Yasuhiro Mochizuki
• 👤 Tadashi Sonobe
• 👤 Kazuo Suzuki

Bibliographic Details