Manufacture of superconducting thin film

Abstract

Abstract PURPOSE:To manufacture a superconducting thin film at the predetermined low temperature by applying an organic metal chelate gas containing Cu and L (L: element such as Y and La) and an O2 gas to the same plasma, while Ba is being sputtered in plasma obtained through magnetron discharge or electron cyclotron resonance under low pressure. CONSTITUTION:While a Ba or Sr target is being sputtered under magnetron discharge or discharge due to electron cyclotron resonance in a chamber decompressed to 10<4> to 10<-4>Torr, metal chelate gases of Cu and L (L: either type of element including Y, La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu) and an O2 gas are supplied to discharge plasma, thereby causing a decomposition and deposition reaction on a substrate. In this case, an acetylacetone chelate of Cu and said L, or dipiraloil methane complex or trifluoro acetylacetone complex is used as the metal chelate. According to the aforesaid method, a superconducting thin film can be manufactured at a low temperature of 300 deg.C or below.

Inventors

• 👤 Masaki Aoki
• 👤 Hideo Torii
• 👤 Akiyuki Fujii
• 👤 Toru Hori

Bibliographic Details