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JPS6451671A Expired / Lapsed JP ⏱️ 0.0 years remaining

Solar cell

Assignee: Canon Inc
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Filing: 1987-08-24
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Granted: —
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Expires: 2007-08-24
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Abstract

Abstract PURPOSE:To obtain, with low cost and large area, a solar cell having the same high conversion efficiency as the one made on a single crystal GaAs substrate, by growing compound semiconductor single crystal on a neucleus-formation surface formed in a non-neucleus-formation surface, the area of the neucleus- formation surface being so minute that only a single neucleus generates. CONSTITUTION:On a substrate 3 composed of SiO2, a lower electrode 2 of AuGe turning to a first electrode is formed, and thereon, the insulating layer of a non-doped SiO2 film 1 is formed. By using reactive ion etching art, holes 1mum in diameter are made at intervals of 100mum to expose the lower electrode 2. This expossed lower electrode turns to a neucleus-formation surface, and the above insulating layer turns to a non-neucleus-formation surface. Further the selective epitaxial growth of GaAs is performed. This first compound semiconductor single crystal 4a is made an Ni type, and this second compound semiconductor single crystal 5 is made a p-type. Between both layers, n-type single crystal is interposed. Finally, a comb-type electrode 9 is formed as a second electrode, on the second compound semiconductor single crystal 5, by sintering.

Inventors

  • 👤 Takao Yonehara

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-02 10:19
CPC Classifications
Y; Y02; Y02E; Y02E10/00; Y02E10/50

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